HfO2 as gate insulator on N-polar GaN-AlGaN heterostructuresChristopher J. Clymore,Subhajit Mohanty,Zhe (Ashley) Jian,Athith Krishna,Stacia Keller,Elaheh AhmadiSemiconductor Science and Technology(2021)引用 6|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要