Enabling Sub-10nm Lithography with Atomic Layer Deposition and Block Copolymer Self AssemblyRicardo Ruiz,Yves-Andre Chapuis,Lei Wan,Shisheng Xiong,He Gao, Kanayialal Patel,Elizabeth Ann Dobisz,Alexei Bogdanov,Paul F. Nealey,Thomas R. AlbrechtMeeting abstracts(2014)引用 0|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要