Tribological behavior of single crystal diamond based on UV photocatalytic reaction

The tribological behaviors of single crystal diamond (SCD) under different UV photocatalytic conditions (UV intensity, H2O2 content, pH) were investigated by ball-on-disk rotating experiments. The results show that both the photocatalytic reaction and the abrasive can improve the material removal rate of SCD and reduce the coefficient of friction. The hydroxyl radicals generated by the photocatalytic reaction can oxidize SCD and generate C-OH on the surface, and the material removal rate of SCD can be controlled by changing the conditions of the photocatalytic reaction. In these experiments, the highest material removal rate of SCD was 4.888 µm3/min. The results provide theoretical support for UV photocatalytic assisted chemical mechanical polishing of SCD.