Optical Antireflection Matrix and Porous Metamaterials for Optoelectronic Devices

—Layered antireflection nanostructures based on SiO 2 /TiO 2 /SiO 2 have been developed for protective glasses of various optoelectronic devices. Optical transmission and reflection characteristics of metamaterials based on synthesized matrix nanocomposites Ag@PMMA are investigated. A new type of optically transparent electrically conductive nanomesh electrode (electrode based on porous anodic aluminum oxide) with a thin gold film has been developed.