Posters

Mark I. Gardner, Jim Fulford, Alan Shafi, Shu Qin, Yongjun Jeff Hu, Brandon Hardie, Mark Roll, Allison J. Christy, Jacob Neff, Jerry D. Harris, David Estrada,Vineet Edupuganti, Matthew Stevens, Elisa Barney Smith, Kristy A. Campbell, Wesley Butler, Kolton Drake,Jiangjiang Gu,Dalong Zhao,Vasanth Allampalli,Daniel Faken,Ken Greiner,David M. Fried

2016 IEEE Workshop on Microelectronics and Electron Devices (WMED)（2016）

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关键词

IEEE Workshop on Microelectronics and Electron Devices,WMED,PMOS devices,plasma doping,PLAD process,high dose implant amorphorized region,P+ implant,device enhancement,poly gate electrode,S-D regions,doping levels,source drain,optimum RTA spike anneal,junction Cap,Cjxn,Cov,overlap Cap,Idoff improvement,Idsat improvement

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