Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond

Nanoimprint lithography, NIL, is an attractive lithography technique for fine feature pattern fabrication, simple process and low cost of ownership. NIL templates play an important role because templates define the resolution of NIL process. In this paper we discussed fine feature hole template fabrication and their performance such as CD uniformity and image placement along with the feature size and duty ratio. In addition, we proposed to apply LELE(Litho-Etch-Litho-Etch) method to fabricate fine feature hole templates and discussed their performances.