Uniformity Analysis of Metallization-Induced Recombination Losses by Photoluminescence Imaging
11TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS (SILICONPV 2021)(2022)
摘要
We present an approach for the determination of the locally averaged recombination parameter j(0,met) assigned to the metal contacts of a solar cell. A set of samples with test fields combined with an interpolation scheme allows the precise prediction of expected local photoluminescence imaging (PLi) intensities for virtually non-metallized sample areas with a standard deviation of 0.7%. The ratio of the actually measured PLi signal in a metallized test field with respect to the predicted signal of the virtually non-metallized test field then serves as an input for numerical simulations for the extraction of j(0,met). We find a clear correlation of the locally determined j(0,met) with both, the local peak firing temperature measured in-situ by a thermal imaging system installed in the firing furnace and the local sheet resistance of the diffused n(+)-region. These results demonstrate the high capability and accuracy of our approach for the uniformity characterization of metallization-induced recombination losses
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关键词
recombination losses,imaging,metallization-induced
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