Surface plasmon-enhanced photodetection of monolayers MoS₂ on an ion beam modified functional substrate

Monolayer molybdenum disulfide (1L-MoS2) is considered a potential optoelectronic device material due to its ultrathin and direct bandgap properties. However, the absorption of incident light by 1L-MoS2 has shown to be relatively low and is not sufficient to implement high photoelectric conversion efficiency, limiting its practical applications in photodetectors. Due to the local surface plasmon resonance effect, the integration of plasma nanoparticles (NPs) with 2D materials may provide a promising method for enhancing light-matter interactions. Nevertheless, MoS2 may undergo fold deformation when transferred to the plasma structure when prepared via conventional strategies, resulting in the introduction of larger defects. In this work, we reported on a photodetector with enhanced MoS2 photoresponsivity on a flat plasmon functional substrate, in which the Ag NPs were embedded into fused silica (SiO2) by ion implantation. Using MoS2/Ag NPs:SiO2 architecture, the photocurrent of the MoS2-based photodetector was significantly improved under incident light of 375, 532, and 635 nm, with a maximum increase of 72.8 times, while the response time also decreased to a certain extent. Furthermore, the plasma functional substrate had the advantages of environmental stability and repeatable recycling, allowing it to be easily integrated with different 2D materials. Thus, this work offered a viable path for realizing efficient photodetectors based on 2D material.