Evaluating the Role of Photoacid Generator and Quencher Loadings on EUV Film Homogeneity

In this study we examined a series of model EUV resists with varying concentration of photoacid generator, PAG, or photodecomposable quencher, PDQ and their effects on resist uniformity using Nano-Projectile Secondary Ion Mass Spectrometry, NP-SIMS. Nanoscale analysis with NP-SIMS is achieved due three innovative features of the technique (1) the mode of data acquisition (2) method of data analysis (3) the nature of the impacting projectile. The results showed that ionic interactions between PAG and PDQ are modified due to the relative/absolute loading of the two components. These results demonstrate the NP-SIMS is a useful tool for assessing the effect of additive loadings on EUV resist uniformity at the nanoscale.