Ammonium chloride (–NH3+Cl-) salt formation from dichlorosilane decomposition and its potential impact on silicon nitride atomic layer deposition

Tsung-Hsuan Yang,Erik S. Cheng, Samuel M. Johnson,Toshihiko Iwao, Jianping Zhao,John G. Ekerdt,Peter L. G. Ventzek,Gyeong S. Hwang

Applied Surface Science（2023）

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摘要

•H and Cl atoms produced from SiH2Cl2 (DCS) decomposition are strongly bound to an amine-functionalized SiN surface by forming –NH3+Cl- complexes.•Ammonium chloride (–NH3+Cl-) salt formation inhibits DCS adsorption and decomposition, leading to a decrease in the SiN growth rate.•Atomic-level insights into the effects of by-products and surface functionality are crucial for design and selection of precursors as well as optimization of the SiN PEALD process.

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关键词

Silicon nitride,Plasma enhanced atomic layer deposition,Dichlorosilane,Ammonium chloride salt formation,First-principles calculation,Spectroscopic analysis

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