Surface Enlargement of Tantalum Capacitor Foils by Pulsed Direct Current Etching and Laser Cladding

Electrochemical etching for the surface enlargement of tantalum capacitor foils has always been a challenge, due to the ultra-high chemical stability of tantalum foils. Herein, pulsed direct current etching of tantalum capacitor foils assisted by laser cladding was investigated and high surface area enlargement was achieved. The effects of electrolyte composition, power supply parameters and external environment on the etching process of tantalum foil were systematically studied, to screen out the best experimental conditions. Furthermore, iron particles with diameters of 3-5 & mu;m were successfully laser cladded on the surface of tantalum foils. These particles will be easily etched in the electrochemical process to form more previous pores, which can serve as etching sites for further tantalum foil etching. Under the best conditions, high-specific capacitance tantalum foils with a capacitance of 155.1 nF/mm2 were obtained at a high forming voltage of 100 V, which were 8 times larger than the unetched light foils. The surface enlargement of tantalum capacitor foils is expected to realize the development of novel tantalum capacitors with both high operating voltage and high capacitance.