Unveiled Ferroelectricity in Well-Known Non-Ferroelectric Materials and Their Semiconductor Applications

Ferroelectric materials are considered ideal for emerging memory devices owing to their characteristic remanent polarization, which can be switched by applying a sufficient electric field. However, even several decades after the initial conceptualization of ferroelectric memory, its applications are limited to a niche market. The slow advancement of ferroelectric memories can be attributed to several extant issues, such as the absence of ferroelectric materials with complementary metal-oxide-semiconductor (CMOS) compatibility and scalability. Since the 2010s, ferroelectric memories have attracted increasing interest because of newly discovered ferroelectricity in well-established CMOS-compatible materials, which are previously known to be non-ferroelectric, such as fluorite-structured (Hf,Zr)O-2 and wurtzite-structured (Al,Sc)N. With advancing material fabrication technologies, for example, accurate chemical doping and atomic-level thickness control, a metastable polar phase, and switchable polarization with a reasonable electric field can be induced in (Hf,Zr)O-2 and (Al,Sc)N. Nonetheless, various issues still exist that urgently require solutions to facilitate the use of the ferroelectric (Hf,Zr)O-2 and (Al,Sc)N in emerging memory devices. Thus, ferroelectric (Hf,Zr)O-2 and (Al,Sc)N are comprehensively reviewed herein, including their fundamental science and practical applications.