Imaging Fermi-level hysteresis in nanoscale bubbles of few-layer MoS 2

The electrical stability and reliability of two-dimensional (2D) crystal-based devices are mainly determined by charge traps in the device defects. Although nanobubble structures as defect sources in 2D materials strongly affect the device performance, the local charge-trapping behaviors in nanobubbles are poorly understood. Here, we report a Fermi-level hysteresis imaging strategy using Kelvin probe force microscopy to study the origins of charge trapping in nanobubbles of MoS 2 on SiO 2 . We observe that the Fermi-level hysteresis is larger in nanobubbles than in flat regions and increases with the height in a nanobubble, in agreement with our oxide trap band model. We also perform the local transfer curve measurements on the nanobubble structures of MoS 2 on SiO 2 , which exhibit enhanced current-hysteresis windows and reliable programming/erasing operations. Our results provide fundamental knowledge on the local charge-trapping mechanism in nanobubbles, and the capability to directly image hysteresis can be powerful tool for the development of 2D material-based memory devices.