Removing or preventing dry etch-induced damage in Al/In/GaN films by photoelectrochemical etching

OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)(2021)

引用 0|浏览2
暂无评分
关键词
photoelectrochemical etching,al/in/gan films,etch-induced
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要