Strategy for Low Temperature HZO Ferroelectric Capacitors for Back-End of Line Applications

2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM(2023)

引用 1|浏览10
暂无评分
摘要
In this report, we discuss methods for obtaining the orthorhombic phase in hafnia-based materials, a necessary condition for the emergence of ferroelectricity. Those methods, including stress engineering with a top electrode, high-pressure annealing, and physical/chemical densification through controlled deposition conditions, can be performed at temperatures suitable for integration into BEOL 3D structures and flexible, wearable technologies. By successfully implementing these techniques, hafnia-based ferroelectric materials can be utilized in a variety of advanced applications.
更多
查看译文
关键词
Low temperature, Hf0.5Zr0.5O2, Atomic layer deposition, Ferroelectric, Back-end-of-line
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要