Impact of High Temperature Up to 175 °C on the DC and RF Performances of 22-nm FD-SOI MOSFETs

IEEE Transactions on Electron Devices(2023)

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摘要
In this work, the effect of rise in temperature from 25 °C to 175 °C on the performance of 22-nm fully depleted silicon-on-insulator (FD-SOI) MOSFETs is studied under different bias conditions. The devices are measured in dc and RF to observe the zero-temperature coefficient (ZTC) point and extract the prominent RF figures of merit (FoMs), i.e., current-gain cutoff frequency ( ${f} _{T}$ ) and maximum oscillation frequency ( ${f} _{\text {max}}$ ). The evolution of transconductance ( ${g} _{m}$ ) with temperature appears to be one of the major causes of the 20% degradation in peak ${f} _{T}$ and ${f} _{\text {max}}$ at 175 °C. From a low-power application point of view, stepping down ${V} _{d}$ from 0.8 to 0.6 V decreases the magnitude of peak ${f} _{T}$ and ${f} _{\text {max}}$ degradation to around 7%–10%, respectively, over the given temperature range while reducing static power consumption ( ${P} _{\text {dc}}$ ) around 29%. Furthermore, the variation of ${f} _{T}$ and ${f} _{\text {max}}$ at and below the ${g} _{m}$ -ZTC is investigated. Below the ${g} _{m}$ -ZTC point, at a front-gate bias ${V} _{g}$ of 0.3 V, an improvement in ${f} _{T}$ of around 20% and an almost steady ${f} _{\text {max}}$ are observed.
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关键词
rf performances,high temperature,fd-soi
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