Impact of High Temperature Up to 175 °C on the DC and RF Performances of 22-nm FD-SOI MOSFETs
IEEE Transactions on Electron Devices(2023)
摘要
In this work, the effect of rise in temperature from 25 °C to 175 °C on the performance of 22-nm fully depleted silicon-on-insulator (FD-SOI) MOSFETs is studied under different bias conditions. The devices are measured in dc and RF to observe the zero-temperature coefficient (ZTC) point and extract the prominent RF figures of merit (FoMs), i.e., current-gain cutoff frequency (
${f} _{T}$
) and maximum oscillation frequency (
${f} _{\text {max}}$
). The evolution of transconductance (
${g} _{m}$
) with temperature appears to be one of the major causes of the 20% degradation in peak
${f} _{T}$
and
${f} _{\text {max}}$
at 175 °C. From a low-power application point of view, stepping down
${V} _{d}$
from 0.8 to 0.6 V decreases the magnitude of peak
${f} _{T}$
and
${f} _{\text {max}}$
degradation to around 7%–10%, respectively, over the given temperature range while reducing static power consumption (
${P} _{\text {dc}}$
) around 29%. Furthermore, the variation of
${f} _{T}$
and
${f} _{\text {max}}$
at and below the
${g} _{m}$
-ZTC is investigated. Below the
${g} _{m}$
-ZTC point, at a front-gate bias
${V} _{g}$
of 0.3 V, an improvement in
${f} _{T}$
of around 20% and an almost steady
${f} _{\text {max}}$
are observed.
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关键词
rf performances,high temperature,fd-soi
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