Crystallization behavior of MnTe/GeTe stacked thin films for multi-level phase change memory

With substantial data storage requirements, enhancing the storage density of emerging non-volatile memories is a common challenge for achieving commercial applications. Phase change memory is capable of multi-level data storage in a storage cell, which can be applied in neural-inspired and all-photonic memory computing. In this study, we propose a MnTe/GeTe stacked thin film structure suitable for multi-level phase change memories and systematically study on the correlation between structure and performance. As the temperature rises, the stacked thin film sequentially crystallizes into form MnTe2, GeTe and Te phases, resulting in three changes in resistance. By utilizing different resistance states, the phase change memory cell based on the MnTe (15 nm)/GeTe (35 nm) stacked thin film can achieve multi-level storage with a 50 ns electrical pulse. The results show that the amorphous thermal stability of the stacked thin films is improved and that the minimal thickness variation before and after crystallization enhances its reliability. Therefore, the MnTe/GeTe stacked thin film is a phase change memory material with favorable structural properties and potential for multi-level storage applications.