Electromagnetic Metasurface Beam Shaping Using Far Field Masks

Electromagnetic metasurfaces (EMMSs) have been an area of intense research in recent years owing to their low profile and reduced cost compared to existing phased-array solutions. EMMSs relate the tangential fields on one side of the surface to the other through their surface parameters. Unfortunately, there is no analytical relationship between the required tangential fields on each side of the EMMS and desired far field criteria in the form of upper and lower masks. Here we present a method for optimizing the EMMS surface parameters to satisfy a given far field upper and lower mask. This involves using the alternating direction method of multipliers to optimize a two-dimensional EMMS model constructed using the method of moments. This model incorporates important inter-cell mutual coupling along with edge effects. An example performing cosecant beam shaping is presented.