Low-Loss Compact Lithium Niobate Photonic Integrated Circuits

Yan Gao,Fuchuan Lei,Marcello Girardi,Raphaël Van Laer,Victor Torres-Company,Jochen Schröder

2023 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)（2023）

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摘要

Lithium niobate (LN) is a promising material among integrated photonics, with applications like high-speed EO modulators, frequency combs, frequency converters, and photon-pair sources [1]. Increasing the system complexity of LN integrated circuits requires large-scale arrays of photonic components [2]. Therefore, an ideal integrated LN waveguide platform should allow dense integration, low propagation losses, and exhibit low fabrication complexity.

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关键词

argo plasma-assisted ion beam dry etching,e-beam exposure,fabrication flow optimization,fully etched LN waveguide platform,LiNbO3/int,low-loss compact lithium niobate photonic integrated circuits,smooth sidewall roughness,ultralow propagation losses,ultrasmall circuit size

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