Near-field scanning microscopy and physico-chemical analysis versus time of SiCN:H thin films grown in Ar/NH3/TMS gas mixture using MW-Plasma CVD at 400 °C
HAL (Le Centre pour la Communication Scientifique Directe)（2018）
关键词
sicnh,thin films,ar/nh3/tms gas mixture,near-field,physico-chemical,mw-plasma
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