Resistive Switching Characteristics of HfO_x/Al₂O₃ Nano-multilayers Structure Memristor Fabricated by Atomic Layer Deposition

We report a novel HfO x /Al 2 O 3 nano-multilayers (nano-MLs) structure memristor with ultrafast program/erase speed (50 ns), large memory window (~10 ⁴ ) and good pulse switching endurance (10 ⁶ cycles) characteristics. Besides, 8 discrete resistance states can be successfully realized by controlling the Reset stop voltage (V Reset-stop ). This indicates the potential capability to store 3 bits in each memristive cell. Through the analysis of the current-voltage (I-V) curves, a progressive decrease in conductance followed by a quantized conductance and finally a multilevel Reset phenomenon can be clearly observed in the Reset process. The Reset dynamics in our designed Ti/HfO x -Al 2 O 3 nano-MLs/Pt memristor can be interpreted as the evolution process of conductive filament as follows: gradually getting thinner followed by being atomic point contact, and eventually disconnecting layer by layer.