检索
AI 对话
analysis
趋势分析
编组
开放平台
more
更多
排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
VIPCreated with Sketch.

Water-soluble bio-sourced resist interactions with fluorine plasmas in etch lithography process

Paule Durin, Corinne Gablin, Aziz Benamrouche,Samar Hajjar‐Garreau,Alexandre Teolis, Nicolas Rochat,Thomas Géhin, Stéphane Trombotto, Thierry Delair,Isabelle Servin,Raluca Tiron,Olha Sysova,Olivier Soppera,Emmanuelle Laurenceau, Jean Louis Leclercq,Yann Chevolot, Didier Léonard

HAL (Le Centre pour la Communication Scientifique Directe)（2022）

引用 0|浏览2
暂无评分
关键词
fluorine plasmas,etch lithography process,water-soluble,bio-sourced
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要