How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning

Mark Neisser,Ndubuisi G. Orji,Harry J. Levinson,Umberto Celano,James Moyne,Supika Mashiro, Dan Wilcox, Slava Libman

COMPUTER（2024）

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摘要

This article highlights the state of the art and critical challenges with lithography and patterning in metrology in enabling yield in next-generation high-volume manufacturing of semiconductors. Each of these technology sectors are presented with respect to the 2023 International Roadmap for Devices and Systems, available freely at https://irds.ieee.org.

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关键词

Extreme ultraviolet lithography,Three-dimensional displays,Data analysis,Metrology,Next generation networking,Photonics

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