Direct Integration of Monolayer WS2 with Lithographically Patterned Carbon Contacts for Memristor Application
ACS APPLIED ELECTRONIC MATERIALS(2024)
摘要
Lithographically patterned carbon microelectrodes, owing to their light weight, excellent thermal stability, chemical inertness, and good electrical conductivity, can be a suitable alternative to metal electrodes commonly employed as contact pads for electrical devices. In the present work, we demonstrate the fabrication of a planar memristor device consisting of monolayer WS2 integrated with photolithographically patterned glass-like carbon (GC) electrodes. The integration of GC with WS2 is carried out by chemical vapor deposition (CVD) of WS2 on the GC electrodes obtained by carbonization of micropatterned phenol-formaldehyde resin (SU8) onto SiO2/Si substrates. The fabricated two-terminal memristor devices exhibit bipolar and asymmetric diode-like memristive characteristics, with a high-to-low resistance ratio of approximately 2 orders of magnitude and a high endurance of 400 cycles. The direct integration of two-dimensional (2D) transition metal dichalcogenides (TMDs) with carbon materials in device geometry provides a platform for low-power device fabrication and enables the fabrication of microelectrodes of any desired shape.
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关键词
2D materials,glass-like carbon microelectrode,photolithography,WS2,chemicalvapordeposition,memristor
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