An electroplated Ag/AgCl quasi-reference electrode based on CMOS top-metal for electrochemical sensing

The integration and mass -production of reference electrodes for CMOS-based electrochemical sensing systems pose a challenge for the accessibility and commercial -viability of such devices. In this paper, a method of electroplating an Ag/AgCl quasi -reference electrode using CMOS top -metal as a base is presented for the first time. The aluminium bond -pad of a CMOS microchip was zincated, an electroless nickel immersion gold layer applied, and a thick silver layer electroplated and chemically chlorinated. The resulting reference electrode was able to provide a stable potential with a drift rate of 0.3 mV/h for up to 18 h. This validates the approach of a fully electroplated bond -pad reference electrode, which offers simplified post -processing and greater scalability of production. Further work towards an entirely electroless process is envisaged.