EUV patterned gate variation reduction in next generation transistor architectures Gopal Sankar Kenath,Martin Burkhardt, Nikhil Jain, Anna Lin,Jennifer Church,Gen Tsutsui, Stephanie Reynoso, Xuan Liu, Chris Sheraw,Pietro Montanini,Eric Miller,Indira Seshadri,Luciana Meli,Nelson FelixOptical and EUV Nanolithography XXXVII(2024)引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要