Identifying trends in photoresist polymer properties to improve line and space defects
Benjamin D. Rafael-Naab,Jong Keun Park,Emad Aqad, Yinjie Cen, Suzanne M. Coley, Li Cui, Conner Hoelzel,Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, Niradha Sachinthani, Michael Finch, Karen E. Petrillo,Li Cheng Advances in Patterning Materials and Processes XLI（2024）
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