EFFECT OF ARGON WORKING GAS PRESSURE ON MECHANICAL STRESSES IN Mo/Si MULTILAYER X-RAY MIRRORS

By the method of X-ray tensometry (lambda=0.154 nm), the dependences of residual stresses in Mo/Si multilayer X-ray mirrors (MXMs) obtained by direct-current magnetron sputtering were studied as a function of the sputtering Ar pressure in the range of 1...4 mTorr. It is shown that an increase in pressure is accompanied by an increase in stresses from similar to 0.4 to similar to 0.8 GPa for a group of mirrors with periods near 7 nm and from similar to 0.9 to similar to 1.6 GPa for a group of mirrors with periods near 14 nm. The angles of texture misorientation for Mo crystallites were measured as a function of argon pressure. Mechanisms have been proposed to explain the reasons for the increase in stresses.