Analysis of Hot Continuous Process of Special Gas Storage Vessel for Semiconductor Cleaning Process

With the development of technology based on the 4th Industrial Revolution, semiconductors have become essential components in various fields, and accordingly, it is necessary to develop special gas storage vessels for semiconductor cleaning processes. To manufacture high-pressure vessels with mechanical strength and corrosion resistance, it is important to design and establish the manufacturing process of the liner. The existing special gas storage vessels are manufactured using a 5-stage cold process, and it takes a long time due to the pre-treatment process between each stage. To solve this problem, it is important to minimize the vessel manufacturing time. In this study, a new process was designed to improve the productivity and reduce the price of high-pressure gas storage vessels that are manufactured using a 5-stage cold process. In the new process, intermediate processes are replaced with the hot continuous processes (2-stages) instead of the cold processes (3-stages). This is a new process that can eliminate the pre-treatment process and reduce the number of processes as well as the manufacturing time. In addition, finite element analysis was performed using design variables (mold temperature, punch speed, initial heating temperature), and an optimal process that does not cause molding defects (wrinkles, tears, etc.) between processes was designed to verify the effectiveness of the new process.