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    Thin Solid Films

    Thin Solid Films

    JournalISSN 0040-6090eISSN 1879-2731中科院 材料科学 4区

    年发文量

    研究主题

    论文（74858）

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    1In-situ Investigation of the Dynamic Optical Constants of Antimony Thin Films During Molecular Beam Epitaxy Using Differential Reflectance Spectroscopy
    Qingqing Luo,Haile Wang, Yuhang Wang, Guoshuai Fan, Yu,Yanning Li,Chunguang Hu,Lidong Sun,Wanfu Shen
    2026
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    2Physics-constrained, Kramers–Kronig-consistent Retrieval of the Refractive Index and Thickness of Porous Silicon Thin Films from Multi-Angle Reflectance
    Guido Mula
    2026
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    3Microstructural Evolution and Property Changes in Sputter-Deposited Al–C Films During Annealing
    Injong Oh,Sunkun Choi,Hojang Kim,Juyeon Han, Zion Lee,Hyunjoo Choi,Gi-Dong Sim
    2026
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    4Ozone Activation Overcomes Nucleation Delay in Poly(methyl Methacrylate) Vapor Phase Infiltration and Enables Processing of Inert Polystyrene
    Yingdong Deng,Wenda Bao, Rongliang Shang, Yifan Wu,Weiyi Lin,Yixiao Liu,Jin Xie
    2026
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    5Plasma-Stoichiometry-Driven Densification Behavior and Moisture Transport Correlation in Low-Temperature Plasma-Enhanced Chemical Vapor Deposition SiO2 Films
    Hyunseo Park, Ire Oh, Sangmin Hong, Seungmin Lee, Yunhui Jang, Seungwoo Chu, Jihun Kang, Junhan Bae, Shurouq Abdulqadir Mohammed, Hyejeong Jin,Yong-Sang Kim,Jang-Kun Song,
    2026
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    立即登录，查看全部 74858 篇论文

    高被引作者

    作者引用发文
    Ray Frost8598281
    Daizy Philip776341
    Kasturi Lal Chopra673462
    Tadatsugu Minami643463
    Lars Hultman579487
    Claes-Göran Granqvist560350
    N. Sundaraganesan513784
    Gero Decher51258
    Howell Edwards5021120
    Hans-Werner Schock456954

    高产作者

    作者引用发文
    Ray Frost8598281
    Howell Edwards5021120
    Yunfei Xi137192
    Lars Hultman579487
    Velappan Krishnakumar312887
    Mehmet Karabacak398487
    James R. Durig231985
    N. Sundaraganesan513784
    C.Yohannan Panicker335282
    Sulekh Chandra327880

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