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    Journal of Crystal Growth

    Journal of Crystal Growth

    JournalISSN 0022-0248eISSN 1873-5002中科院 材料科学 4区

    年发文量

    研究主题

    论文（39465）

    排序
    1Corrigendum to “nucleation Behavior Simulations of SiC Epitaxy on Different-Orientation Substrates by Molecular Dynamics” [J. Cryst. Growth 696 (2026) 128854]
    Shicheng Zhu, Yong Li, Qun Tan, Jiahui Wang,Pin Wang, Haifeng Yang, Le Yu,Rui Jin,Mingsheng Xu,Zheyang Li
    2027
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    2Tungsten-modified Molybdate-Based Solvent for LBO Crystal Growth
    Elona Khan, Artem Kuznetsov,Ekaterina Simonova,Konstantin Kokh
    2027
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    3MOCVD Epitaxy of Predominantly Ε-Ga2o3 on GaN Enabled by an Oxygen Pretreatment Regulated GaOxNy Nucleation Layer and a Strain Buffering Transition Layer
    Zhengze Zhang,Yachao Zhang, Xin Cheng, Shuqin Li, Yuhong Liu, Baiqi Wang,Long Wang, Hao Lin, Zhijie Zhang,Yue Hao,Jincheng Zhang
    2027
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    4Crystal Orientations Evolution of HVPE-Grown Β-Ga2o3 Films
    Jing Liu,Yuewen Li,Wenxiao Wu,Zili Xie, Tao,Peng Chen,Bin Liu,Rong Zhang,Youdou Zheng,Xiangqian Xiu
    2027
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    5Β-Ga2o3 Epitaxy Via H2O-assisted MOCVD
    Yiming Zhang,Paiwen Fang,Wenyong Feng, Run Wang,Jiapeng Liu,Jian Li, Hancheng Zhong,Jun Liang, Gang Wang,Yanli Pei
    2027
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    立即登录，查看全部 39465 篇论文

    高被引作者

    作者引用发文
    Tsuguo Fukuda7372192
    P. Ramasamy6539213
    Yitai Qian497893
    Isamu Akasaki448286
    Hiroshi Amano441394
    Kazumasa Hiramatsu437055
    Gerald Stringfellow433189
    Akira Yoshikawa3930161
    Koichi Kakimoto3733138
    P. Bennema351888

    高产作者

    作者引用发文
    P. Ramasamy6539213
    Tsuguo Fukuda7372192
    Akira Yoshikawa3930161
    Koichi Kakimoto3733138
    Michael Heuken1725128
    Markus Weyers3021118
    Chung-Wen Lan3039110
    Thomas F. Kuech240499
    Akinori Koukitu254396
    Hiroshi Amano441394

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