The paper investigates regularities pertaining to structure formation in a thin-film coating applied on diamond crystals by magnetron dispersion of a combined cathode (Si + C). It has been established that an amorphous layer of Si and C atom mixture is formed in the condensation process of a thin-film coating (up to 20 µm) and its glow-discharge plasma processing is accompanied by action of plasma particles along with formation of surface waves that contributes to transfer of active carbon atoms and formation of stronger Si – C connection. Structure formation in coatings (Si + C) with thickness over 100 µm proceeds according to diffusion mechanism at low temperatures (650–850oС) with formation of α-SiC with an amorphous layer. Solid-phase reactive sintering of simple elements (silicon and carbon) in nano-coatings obtained with the help of diamond powders allows to make composites of such powders with the given complex of properties due to control of structure of particle-connection zone on atom-cluster levels.
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