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    专

    种锡钛酸钡厚膜陶瓷及其应用

    9054140U
    发明人
    LU SHENGGUO, LI JIANG, YAO YINGBANG, TAO TAO, LIANG BO
    受让人
    UNIV GUANGDONG TECHNOLOGY
    申请人
    ART1 Inc.
    申请号
    547254
    申请日
    2015-01-06
    公开(公告)号
    9054140U
    公开(公告)日
    2023-11-08
    IPC分类号
    A61F002/16A61B017/00A61F009/007A61F009/00
    CPC分类号
    -
    优先权号
    311476
    优先权日
    1995-11-29
    摘要

    Forming a tamperproof coating on an electronic device is claimed comprising (A) forming a protection layer on the electronic device by applying a composition comprising a preceramic silicon-containing material and a filler to a surface of the electronic device and thereafter heating the composition to a temperature sufficient to convert the preceramic silicon-containing material into a silica-containing ceramic having filler dispersed therein; and (B) forming a resin sealer coat over the protection layer by applying a sealer resin selected from colloidal inorganic-based siloxane resins, benzocyclobutene based resins, a polyimide polymer, a siloxane polyimide and parylenes and thereafter curing the sealer resin to produce the resin sealer coat.

    USE -This multi-layer tamper-proof coating is used to protect electronic devices, such as silicon based devices, gallium arsenide based devices, focal plane arrays, opto-electronic devices, photovoltaic cells and optical devices.

    ADVANTAGE -This coating renders the electronic device resistant to analytical techniques such as ozone, UV-ozone, gaseous free radicals and ions, vapour or liquid-borne reactive species, plasma, abrasion, radiation, light, wet etching and others; moisture; chemicals and other environmental contaminants; shock and erosion, delamination and/or separation.

    权利要求
    1. An ultrasonic transducer apparatus, comprising: a bonded structure having: a substrate having a metal oxide semiconductor (MOS) integrated circuit and an electrode; a conductive membrane bonded to the substrate such that a sealed cavity exists between an uppermost portion of the substrate and a first side of the conductive membrane, thereby defining, at least in part, an ultrasonic transducer, with the sealed cavity disposed between the conductive membrane and the electrode; and the uppermost portion of the substrate providing an electrical connection between the MOS integrated circuit and the first side of the conductive membrane.
    2. The ultrasonic transducer apparatus of claim 1 , wherein the uppermost portion of the substrate comprises a conductive standoff.
    3. The ultrasonic transducer apparatus of claim 2 , wherein the conductive standoff comprises titanium nitride (TiN).
    4. The ultrasonic transducer apparatus of claim 1 , wherein the uppermost portion of the substrate comprises both an insulating material and a conductive material.
    5. The ultrasonic transducer apparatus of claim 1 , wherein the uppermost portion of the substrate comprises an insulating material having a conductive via embedded therein.
    6. The ultrasonic transducer apparatus of claim 5 , wherein the insulating material comprises silicon oxide (SiO 2 ) and the conductive via comprises tungsten (W).
    7. The ultrasonic transducer apparatus of claim 1 , wherein the conductive membrane has a substantially uniform thickness.
    8. The ultrasonic transducer apparatus of claim 1 , wherein the conductive membrane has a peripheral portion of a first thickness and center portion of a second thickness, the second thickness greater than the first thickness and corresponding to a location opposite the electrode.
    9. The ultrasonic transducer apparatus of claim 8 , wherein the first side of the conductive membrane proximate the cavity has a substantially planar surface, and a second side of the conductive membrane opposite the first side has a non-planar surface.
    10. The ultrasonic transducer apparatus of claim 8 , wherein the first side of the conductive membrane proximate the cavity has a non-planar surface, and a second side of the conductive membrane opposite the first side has a substantially planar surface.
    11. The ultrasonic transducer apparatus of claim 1 , further comprising a membrane stop disposed between the electrode and the conductive membrane.
    12. The ultrasonic transducer apparatus of claim 11 , wherein the membrane stop is configured to come into contact with both the electrode and the conductive membrane in a collapse mode of operation.
    13. A method, comprising: bonding a first wafer to a semiconductor wafer, the semiconductor wafer having a metal oxide semiconductor (MOS) integrated circuit and an electrode; removing at least a portion of the first wafer to define a conductive membrane such that a sealed cavity exists between an uppermost portion of the semiconductor wafer and a first side of the conductive membrane, thereby defining, at least in part, an ultrasonic transducer, with the sealed cavity disposed between the conductive membrane and the electrode; and the uppermost portion of the semiconductor wafer providing an electrical connection between the MOS integrated circuit and the first side of the conductive membrane.
    14. The method of claim 13 , wherein the uppermost portion of the semiconductor wafer comprises a conductive standoff.
    15. The method of claim 14 , wherein the conductive standoff comprises titanium nitride (TiN).
    16. The method of claim 13 , wherein the uppermost portion of the semiconductor wafer comprises both an insulating material and a conductive material.
    17. The method of claim 13 , wherein the uppermost portion of the semiconductor wafer comprises an insulating material having a conductive via embedded therein.
    18. The method of claim 17 , wherein the insulating material comprises silicon oxide (SiO 2 ) and the conductive via comprises tungsten (W).
    19. The method of claim 13 , wherein the conductive membrane has a substantially uniform thickness.
    20. The method of claim 13 , wherein the conductive membrane has a peripheral portion of a first thickness and center portion of a second thickness, the second thickness greater than the first thickness and corresponding to a location opposite the electrode.
    21. An apparatus, comprising: a semiconductor wafer having an integrated circuit; an electrode; an insulating material having a cavity formed at least partially therein; a conductive layer contacting the insulating material, sealing the cavity and having a first side proximate the cavity and a second side distal the cavity, wherein the electrode, cavity, and conductive layer together define, at least in part, an ultrasonic transducer, with the cavity being between the electrode and the conductive layer; a conductive contact coupling the electrode to the integrated circuit; and a conductive plug embedded in the insulating material and terminating on the first side of the conductive layer proximate the cavity such that a surface of the conductive plug is bonded with the first side of the conductive layer, wherein the conductive plug electrically connects the conductive layer to the integrated circuit, and wherein the electrode and the conductive plug are electrically isolated from each other.
    22. The apparatus of claim 21 , wherein the semiconductor wafer is a silicon wafer.
    23. The apparatus of claim 21 , wherein the insulating material is silicon oxide.
    24. The apparatus of claim 21 , wherein the conductive plug comprises titanium nitride.
    25. An apparatus, comprising: a semiconductor wafer having an integrated circuit; an electrode; an insulating material having a cavity formed at least partially therein; a conductive membrane contacting the insulating material, sealing the cavity and having a first side proximate the cavity and a second side distal the cavity, wherein the electrode, cavity, and conductive membrane together define, at least in part, an ultrasonic transducer, with the cavity being between the electrode and the conductive membrane; a conductive contact coupling the electrode to the integrated circuit; and a conductive plug embedded in the insulating material and terminating on the first side of the conductive membrane proximate the cavity without extending through the conductive membrane such that a surface of the conductive plug forms at least part of a bonding interface between the first side of the conductive membrane and the insulating material, the conductive plug electrically connecting the conductive membrane to the integrated circuit, wherein the electrode and the conductive plug are electrically isolated from each other, and wherein the apparatus lacks an electrode that is on the second side of the conductive membrane and that overlies the cavity.
    26. The apparatus of claim 25 , wherein the semiconductor wafer is a silicon wafer.
    27. The apparatus of claim 25 , wherein the insulating material is silicon oxide.
    28. The apparatus of claim 25 , wherein the conductive plug comprises titanium nitride.
    说明书
    [0001]技术领域
    [0002]本实用新型涉及窗帘领域,尤其涉及一种垂直可调光双层布纱一体窗帘单元及窗帘。
    [0003]背景技术
    [0004]布纱结合一体窗帘是一款消费者比较期待的窗帘,纱网薄的地方越薄越好,越细腻越好,布面厚的地方越厚越好,越隔音越好,越遮光越好。目前市场上的布纱结合一体窗帘是用专业的一款经编针织机生产,因面料结构有布又有纱,薄厚一体织造,纱与布的经纬密相互牵制、核心,有以下几点缺陷:(1)设备选择不多,对机器的选型限制比较大,布料厚的部分对机器梳栉数要求多;(2)材料要求限制,对纱线的选择限制比较多,太粗的不好织,太细的厚度不够;(3)效率产能不高,机器生产速度,对机器使用来定位,要么薄的统一织造,要么厚的统一织造,这两者生产效率都很高,但是薄厚一体织造的生产效率就会大大降低;(4)机器与工人要求高,有厚有薄厚的地方,从使用的角度来定位,需要薄的部分尽可能的做薄,厚的部分尽可能的做厚,但是对设备要求高,对挡车工要求也很高;(5)产品的品质不易控制,薄的地方太薄,厚的地方太厚,薄厚同步生产过程中容易断线断纱断针,一旦断纱断针,就要停车,一旦停车布面就会产生停车痕,因此品质不好控制;(6)遮光遮阳性差,因产品的结构性,一个单元10到50公分为一个循环,整份布料由3到6个单元组成,产品在应用时要一个单元一个单元拆开,即10到50公分的宽幅,在拆条过程中,既要没有散纱,又没有过多的线头,目前市面上最理想的属经编针织工艺领域,但经编针织工艺的缺陷就是密度欠缺,遮阳遮光性差,没有梭织工艺的遮阳遮光效果好。因产品的结构要求,需要给厚的部分做面料的涂层,来弥补遮阳遮光性差的缺陷,但实际操作工艺并不好操做。(布)厚与(纱)薄之间的界限,在加工过程中很难处理;(7)后道处理加工程序复杂,因产品结构为布纱布的几个小单元组成,在定型过程中,要控制好布(厚)与纱(薄)的缩率平衡点。
    [0005]如中国专利号为2022207881147的实用新型专利,公开了一种垂直可调光布纱一体窗帘,包括垂直交替排布的遮光部和透光部,所述透光部为透光的薄纱网,所述遮光部由上层布面、中层薄纱网、下层布面组成,中层薄纱网是与透光部一体的薄纱网,上层布面和下层布面为一块不透光的布面,上层布面和下层布面包覆在中层的薄纱网上下两面形成遮光部。本实用新型的布纱一体窗帘采用布与纱单独织造、单独定型,布与纱不受厚薄经纬相互牵制,面料垂直度较高,克服了薄厚同步生产过程中容易断线断纱断针的缺陷。纱网与布面可以使用不同粗细的纱线织造,最终织造出来不同密度、不同厚度、不同花纹的纱网与布面。但本实用新型的窗帘只有一层,风吹过来容易晃动,纱网的网孔一样大,这样会造成视觉上的眩晕感。
    [0006]本实用新型所要解决的技术问题在于克服现有的技术缺陷,提供一种垂直可调光双层布纱一体窗帘单元及窗帘。产品在结构升级后,窗帘单元两边的薄纱网可以选用不同大小的网孔,这样可以消除视觉上的眩晕感。由于本实用新型是两层窗帘,因此消费者无论是从正面或者是从反面看过去,都呈现出正面的效果,且正面的布和反面的布可以选用不同的颜色和花型,使正面和反面看过去的视觉效果不同,以适应不同的客户需求。由于本实用新型的窗帘有两层,因此增了窗帘整体的稳定性,风吹过来不容易晃动。本实用新型的窗帘是由多个窗帘单元组成,每个窗帘单元可以根据需要单独定制,单独悬挂,单独拆卸,避免了窗帘损坏需要全部拆除的不便。
    [0007]实用新型内容
    [0008]本实用新型针对现有技术中布纱结合一体窗帘稳定性差,视觉效果差等缺点,提供了一种垂直可调光双层布纱一体窗帘单元及窗帘。
    [0009]为了解决上述技术问题,本实用新型通过下述技术方案得以解决:
    [0010]一种垂直可调光双层布纱一体窗帘单元,所述窗帘单元包括垂直交替排布的遮光部和透光部,所述透光部为透光的薄纱网,所述遮光部为不透光布面,两个遮光部和两个透光部交替首尾相接形成封闭形状的双层窗帘单元。窗帘的基本造型为竖百叶,由一层布一层纱交替形成,用户可以根据窗户的尺寸需要定制不同宽度的窗帘。该窗帘单元整体为遮光部和透光部交替排布形成的封闭圆环形,因此为双层窗帘单元,整体稳定性高,不易在风吹时晃动。此外,该窗帘单元可以做成标准件,提前量产,降低企业的运营成本,更为社会节约资源,降低能耗,更环保。
    [0011]作为优选,所述遮光部为单层布面,所述透光部为纱网,布面和纱网之间的连接方式为超声波焊接、胶粘或者缝纫。单层布面和纱网之间首尾相接,窗帘整体更轻薄。
    [0012]作为优选,所述遮光部为双层布面,所述透光部为纱网,所述遮光部与透光部交替首尾相接的方式是两层布面将纱网包覆在中间,布面和纱网之间的连接方式为超声波焊接、胶粘或者缝纫。双层布面和纱网之间首尾相接,不同的固定方式有其各自的优缺点,可以根据用户的需要选择不同的固定方式,固定牢固,不易松动。
    [0013]作为优选,所述双层布面中间夹设有中空层材料,以实现隔音作用。中空层材料可以为海绵、泡沫等重量轻且有较好的隔音效果的材料。
    [0014]作为优选,所述布面为反光的面料制成,可以折射光线以实现物理降温,达到隔热作用。朝向窗户外部的布面可以选用反光面料,在外面温度较高的情况下实现隔热降温,使光线不会透过窗帘进入室内。
    [0015]作为优选,所述遮光部的宽度可以大于、小于或者等于透光部的宽度。遮光部即遮光布,可以遮盖物品起到避免与强光接触的作用,透光部即透光布,可以透过光线的照射。用户可以调整遮光部与透光部的竖直角度来实现不同的遮光需求。
    [0016]作为优选,所述布面可选用不同的颜色和不同的纹理,所述纱网也可选用不同的颜色和不同的纹理。这样可以实现一帘两用,根据室内环境需求实现两种不同的风格。
    [0017]作为优选,所述纱网与布面在连接之前为单独织造、单独定型,所述纱网与布面可以使用不同粗细的纱线与不同的设备织造,最终织造出来不同密度、不同厚度、不同花纹、不同颜色的纱网与布面,所述纱网与布面经过定型后自由垂落六米的误差可以大于、小于或者等于1厘米,所述纱网与布面选用阻燃纱线织造,以实现永久性阻燃。单独织造与定型的效率高、纱线的选择范围较宽,克服了薄厚同步生产过程中容易断线断纱断针的缺陷。该种布纱一体的窗帘要求垂直度较高,从而达到自由垂直旋转的效果,因此传统的布与纱一体织造就达不到目标垂直度的要求。布与纱单独织造,就不涉及布与纱厚与薄接头处的界限,可以控制好布(厚)与纱(薄)的缩率平衡点,大大提高了窗帘的质量与制造效率。
    [0018]一种垂直可调光双层布纱一体窗帘,其特征在于:包括至少两个上述述的单元,各单元在窗帘导轨上可单独悬挂,单独拆卸,各单元之间可分离,也可以缝纫、焊接或者粘贴的方式连接。本实用新型的目的之一在于实现窗帘布可拆卸,满足更换和拆洗的需要,而固定架一般为铝合金框架,费用较高,安装到墙面上往往需要打孔,安装很牢固,很难将其从墙面上拆卸下来。人们在更换窗帘时只需更换窗帘布而不用将固定架拆下,这样固定架就可以多次使用,大大节省了成本,也避免了拆卸固定架的不便。消费者自己在家可轻松更换新的面料,塑料配件与铝材框架不换,窗帘布料可以根据不同的节日氛围随意更换,窗帘布料旧了、脏了,或者不喜欢,也可以根据不同的节日氛围,随意更换自己喜欢的颜色款式,来装饰室内环境,非常适合年轻一代消费者,也非常适合老一代的节俭习惯,因此可以提前量产,降低企业的运营成本,更为社会节约资源,降低能耗,更环保。
    [0019]作为优选,所述窗帘可垂直旋转调光,当前后两层的遮光部旋转至错位位置时,窗帘整体为遮光状态,当前后两层遮光部旋转至重合位置时,窗帘整体为透光状态。当遮光部与透光部旋转到一定角度后,窗帘呈现不同程度的遮光状态,用户可以根据实际需要来调整遮光部与透光部的任意角度来调整窗帘的遮光状态。
    [0020]本实用新型由于采用了以上技术方案,具有以下显著的技术效果:
    [0021](1)窗帘单元两边的薄纱网可以选用不同大小的网孔,这样可以消除视觉上的眩晕感。
    [0022](2)由于本实用新型是两层窗帘,因此消费者无论是从正面或者是从反面看过去,都呈现出正面的效果,且正面的布和反面的布可以选用不同的颜色和花型,使正面和反面看过去的视觉效果不同,以适应不同的客户需求。
    [0023](3)由于本实用新型的窗帘有两层,因此增了窗帘整体的稳定性,风吹过来不容易晃动。
    [0024](4)本实用新型的窗帘是由多个窗帘单元组成,每个窗帘单元可以根据需要单独定制,单独悬挂,单独拆卸,避免了窗帘损坏需要全部拆除的不便。
    [0025](5)本实用新型的窗帘可实现隔热、隔音、阻燃的效果,且可以实现一帘两用,实现两种不同的颜色,两种不同风格的窗帘。
    [0026]附图说明
    [0027]图1是本实用新型窗帘单元的立体结构示意图。
    [0028]图2是本实用新型实施例1窗帘单元透光状态旋转成遮光状态的截面示意图。
    [0029]图3是本实用新型实施例2窗帘单元透光状态旋转成遮光状态的截面示意图。
    [0030]图4是本实用新型实施例3窗帘的截面示意图。
    [0031]附图中各数字标号所指代的部位名称如下:
    [0032]1-遮光部;1.1-布面一、1.2-布面二、1.3-布面三、1.4-布面四;2-透光部;2.1纱网一、2.2-纱网二。
    [0033]具体实施方式
    [0034]下面结合附图与实施例对本实用新型作进一步详细描述。
    [0035]实施例1:
    [0036]如图1、2所示,一种垂直可调光双层布纱一体窗帘单元,所述窗帘单元包括垂直交替排布的遮光部1和透光部2,所述透光部2为透光的薄纱网,所述遮光部为不透光布面,两个遮光部1和两个透光部2交替首尾相接形成封闭形状的双层窗帘单元。所述遮光部1为单层布面一1.1和布面四1.4,所述透光部2为纱网一2.1和纱网二2.2,布面和纱网之间的连接方式为超声波焊接、胶粘或者缝纫。
    [0037]实施例2:
    [0038]如图1、3所示,所述遮光部1为双层布面一1.1、布面二1.2、布面三1.3和布面四1.4,所述透光部2为纱网一2.1和纱网二2.2,所述遮光部1与透光部2交替首尾相接的方式是两层布面将纱网包覆在中间,布面和纱网之间的连接方式为超声波焊接、胶粘或者缝纫。所述双层布面一1.1和布面二1.2中间、布面三1.3和布面四1.4中间夹设有中空层材料,以实现隔音作用。所述布面一1.1和布面三1.3为反光的面料制成,可以折射光线以实现物理降温,达到隔热作用。所述遮光部1的宽度可以大于、小于或者等于透光部2的宽度。所述布面一1.1、布面二1.2、布面三1.3和布面四1.4可选用不同的颜色和不同的纹理,所述纱网一2.1和纱网二2.2也可选用不同的颜色和不同的纹理。所述纱网与布面在连接之前为单独织造、单独定型,所述纱网与布面可以使用不同粗细的纱线与不同的设备织造,最终织造出来不同密度、不同厚度、不同花纹、不同颜色的纱网与布面,所述纱网与布面经过定型后自由垂落六米的误差可以大于、小于或者等于1厘米,所述纱网与布面选用阻燃纱线织造,以实现永久性阻燃。
    [0039]实施例3:
    [0040]如图4所示,一种垂直可调光双层布纱一体窗帘,包括至少两个上述的单元,各单元在窗帘导轨上可单独悬挂,单独拆卸,各单元之间可分离,也可以缝纫、焊接或者粘贴的方式连接。所述窗帘可垂直旋转调光,当前后两层的遮光部1旋转至错位位置时,窗帘整体为遮光状态,当前后两层遮光部1旋转至重合位置时,窗帘整体为透光状态。
    [0041]本实用新型的窗帘单元两边的薄纱网可以选用不同大小的网孔,这样可以消除视觉上的眩晕感。由于本实用新型是两层窗帘,因此消费者无论是从正面或者是从反面看过去,都呈现出正面的效果,且正面的布和反面的布可以选用不同的颜色和花型,使正面和反面看过去的视觉效果不同,以适应不同的客户需求。由于本实用新型的窗帘有两层,因此增了窗帘整体的稳定性,风吹过来不容易晃动。本实用新型的窗帘是由多个窗帘单元组成,每个窗帘单元可以根据需要单独定制,单独悬挂,单独拆卸,避免了窗帘损坏需要全部拆除的不便。
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