Quaternary TiZrAlN and TiZrSiN films with Ti : Zr ratio of ~1 : 1 and different Al (or Si) content were deposited by simultaneous reactive magnetron sputtering of Ti, Zr, and Al (or Si) targets under Ar + N 2 plasma discharges. The elemental composition was determined by WDS and RBS methods; the phase composition was studied by X-ray diffraction. It was found that the c -(Ti,Zr,Al)N solid solution of substitution type is the basis of the (Ti,Zr) 1– x Al x N (0.06 ≤ x ≤ 0.65) system. For the (Ti,Zr) 1– x Si x N system (0.13 ≤ x ≤ 0.41), a dual-phase structure composed of a nanocomposite on the basis of the c -(Ti,Zr)N solid solution and grainboundary amorphous a -SiN y phase is typical. Appearance of the second a -SiN y phase promotes an amorphization of the films. Vacuum annealing of the films investigated at temperatures up to 1000°C does not lead to decomposition of the solid solutions which constitute the films. Both rather high deposition temperature (600°C) and stoichiometric nitrogen content can be the reasons for thermal stability of the films. Annealing-induced Al depletion of c -(Ti,Zr,Al)N solid solution grains is observed in (Ti,Zr) 1– x Al x N films caused by the growth of the AlN based wurtzite phase at the grain boundaries.

The influence of preliminary implantation of argon ions on a carbon steel substrate and deposition temperature on the texture and adhesion of TiN coatings deposited by cathodic arc plasma deposition has been investigated. The samples have been evaluated by glancing X-ray diffraction, Auger-electron spectroscopy and scratch adhesion testing. Strengthening of the (220) TiN texture with increasing ion implantation dose on the substrate has been revealed. An increment of deposition temperature (from 450 up to 720 K) leads to a more chaotic orientation of TiN crystallites. An increase of transitional layer thickness (by 60% for the Ti profile) is only observed when depositing the coating at high temperature (720 K). However, both the preliminary implantation process and the heating of the substrate lead to an adhesion improvement of TiN coatings.

The influence of substrate irradiation by argon ions before plasma deposition of a titanium coating on its physical and mechanical properties was considered. The samples were investigated by glancing X-ray diffraction, scratch adhesion and friction coefficient measurements. It was shown that the proposed technology of the substrate surface treatment allows the improvement of the titanium film adhesion and to increase its wear resistance up to 80%. An improvement of the mechanical properties of the Ti-steel system is accounted for by the intensification of Ti diffusion into the substrate at the expense of the preliminary irradiation with Ar+ ions. (C) 1998 Elsevier Science S.A.