极紫外(EUV)宽带多层膜的光谱性能对膜厚控制精度要求较高,仅由时间控制膜厚的镀膜系统难以满足其精度控制要求.本文提出了基于进化算法的宽带EUV多层膜离散化膜系设计方法,与传统膜系设计相比,离散化膜系所制备多层膜具有更为优良的EUV反射光谱性能.为验证离散化膜系设计在宽带EUV多层膜研制中的优越性,采用磁控溅射方法对具有离散化膜系的宽带多层膜反射镜进行了制备和测试.测试结果表明:研制的宽角度多层膜反射镜可实现入射角带宽为0°～17°,高于41％的反射率;研制的堆栈宽角度多层膜反射镜可实现入射角带宽为0°～18.5°,高于35％的反射率;研制的宽光谱多层膜反射镜可实现波长带宽为12.9～14.9 nm,高于21％的反射率.

Quantum state genetic algorithm was applied into the discrete design of broadband extreme-ultraviolet multilayer to solve the problem of solving accuracy in genetic algorithm. And the discrete design of layer thickness can be achieved in the process of quantum state genetic algorithm. It solves the problem that the layer can be accurately fabricated when the magnetron sputtering system is controlled by the deposition time. According to the results designed by quantum state genetic algorithm, broadband extreme-ultraviolet multilayers have been fabricated by magnetron sputtering system. The measured results show two kinds of multilayers designed by quantum state genetic algorithm were fabricated, one has a reflectivity of more than 45% in the 0 degrees similar to 15 degrees range of incidence angle, and the other reaches the reflectivity of more than 20% for the wavelength range from 13 nm to 15 nm. The relative work shows the potential value of quantum state genetic algorithm and offers another alternative optimizing algorithm in the field of broadband extreme-ultraviolet multilayer design. And then the algorithm can achieve the discrete design of multilayer, which makes fabricated multilayer have better spectral properties.