We investigate the parameters of microstructures obtained by laser thermochemical writing in molybdenum films of thickness 17, 35, and 70 nm deposited on glass and quartz substrates. Graphs of the spatial resolution of the microstructures as a function of the laser power are plotted for different substrate materials. It is shown that a higher spatial resolution of the microstructures can be achieved in the molybdenum films with a 17-nm thickness.

The problem of reducing the thickness of the lines of contact pattern masks used in the formation of micro-relief of diffractive optical elements (DOEs) and produced by laser ablation of thin films of refractory metals. For contact mask of DOEs on molybdenum films with thickness of 40 nm using a laser ablation patterns recorded with elements of the picture width 0.25–0.3 µm. This is approximately 3 times smaller than the characteristic dimensions, obtained by thermochemical recording chromium films of the same thickness in the standard process. Reactive ion etching in an inductively coupled plasma through a mask was formed micro-relief height up to 300 nm in a quartz substrate. We have shown promising applications of thin films of molybdenum as a metallic mask in the formation of microrelief of DOEs.

Creation of a diffraction binary lens on the basis of galvanic besieged copper for work in a x-ray range of lengths of waves is described. The relief was formed of a layer of the resist put on an initial copper film, by means of electronic lithograph. Experiments showed presence after manifestation of a resist thin, nonconducting a film current on an initial copper surface. It interferes with further galvanic sedimentation of a continuous layer of copper. Therefore, further researches should be directed on working off of a mode of lithograph for the purpose of study of a layer of a resist for full thickness.

Electron beam lithography and reactive ion etching has been used to advantage in the development of curved diffractive gratings for UV with 200 nm pitch size on the quartz substrate. The application of the technology is described.

We investigated binary axicons with periods 4 um, 6 um and 8 um, manufactured by photolithography technology with resolution 1 mm, depth 500 n m and diameter 4 mm. It is shown experimentally that in the near diffraction zone along the optical axis at a distance of up to 40 um from the a xi- con appear focal spot with a diameter of 3,5 λ up to 4,5 λ (for the axicon with a period T =4 um) and from 5 λ to 8 λ (for the axicon with a period T =8 um), λ - wavelength of light (λ =0.532 um). First focus arises at a distance of 2 um (T =4 um), and focal spots appear with a period of 2 um (for T =4 um) and 4 um (for T =8 um). We produced simulation of diffraction of plane and diverging linearly polarized light waves with the program FullWAVE (RSoft) and the original program R-FDTD, that implement finite difference methods for 3D solution of Maxwell's equations in Cartesian and cylindrical coordinate systems. Numerical values of the diameters of focal spots on the optical axis in the near diffraction zone for the axicon with a period T=4 um agree with experimental data.