Heavily doped 3C-SiC films based on semi-insulating 6H-SiC substrates were obtained by sublimation epitaxy. The structural perfection of the obtained samples was monitored by X-ray diffractometry. The measurements of the photoluminescence and Hall effect spectra have confirmed the rather high perfection of the obtained epitaxial layers.

Heavily doped 3C-SiC films based on semi-insulating 6H-SiC substrates were obtained by sublimation epitaxy. The structural perfection of the obtained samples was monitored by X-ray diffractometry. The measurements of the photoluminescence and Hall effect spectra have confirmed the rather high perfection of the obtained epitaxial layers.

Results of an epitaxial growth of 3C-SiC epilayers on hexagonal 6H-SiC, 4H-SiC substrates are described. The study of the obtained epitaxial layers grown on 6H substrates was made by photoluminescence and optical microscopy. Also, an image analysis of the interface of 3C-SiC epitaxial layers with 6H, 4H, and 15R substrates obtained by Transmission Electron Microscopy (TEM) are presented. Difference between the layers on the Si and C faces are discussed.

Исследовано воздействие протонного облучения с энергией 8 МэВ на эпитаксиальные слои n-3C-SiC, выращенные методом сублимации на полуизолирующих подложках 4H-SiC. Изменения параметров образцов регистрировали методом эффекта Холла и по спектрам фотолюминесценции. Метод Холла был применен для раздельной оценки влияния облучения на концентрацию и подвижность носителей заряда. Скорость удаления носителей (Vd) составила ~110 см-1. Полная компенсация образцов с исходной концентрацией носителей заряда 6.5·1017 см-3 наблюдалась при дозах облучения ~6·1015 см-2. Подвижность носителей заряда при таких дозах облучения уменьшалась всего в 2.5 раза. По сравнению с 4H и 6H карбида кремния не было отмечено значительного увеличения интенсивности так называемой "дефектной" фотолюминесценции. DOI: 10.21883/FTP.2017.08.44795.8535

Effects of proton irradiation in n-3C-SiC grown by sublimation on a 4H-SiC substrate have been studied by the Hall effect and photoluminescence methods. It was found that the carrier removal rate (Vd) reaches a value of ~110 cm-1. The full compensation of samples with an initial concentration of (1-2) x 1018 cm -3 was estimated to occur at doses of about 6 x 1015 cm -2. Compared with 4H and 6H silicon carbide, no significant increase in the intensity of so-called "defective" photoluminescence was observed in 3C-SiC.

The effects of 8-MeV proton irradiation on n-3C-SiC epitaxial layers grown by sublimation on semi-insulating 4H-SiC substrates are studied. Changes in the sample parameters were recorded by the Hall-effect method and judged from photoluminescence spectra. The Hall method was employed to distinguish between the effects of irradiation on the charge-carrier concentration and mobility. It is found that the charge-carrier removal rate (V d ) is ~110 cm–1. Full compensation of the samples with an initial charge-carrier concentration of ~6.5 × 1017 cm–3 is observed at irradiation doses of ~6 × 1015 cm–2. It is found that the mobility at these doses decreased by only a factor of 2.5. Compared with 4H and 6H silicon carbide, no significant increase in the intensity of so-called defect-related photoluminescence is observed.

Transmission electron microscopy has been used to study the structure of a transition layer between a hexagonal substrate (6H-SiC and 4H-SiC) and a cubic silicon carbide layer grown by sublimation epitaxy in vacuum. It is shown by microdiffraction analysis that the transition layer with a thickness of 210 nm is constituted by alternating layers of cubic (3C) and hexagonal (6H) silicon carbide. It is demonstrated that 6H-SiC/3C-SiC and 4H-SiC/3C-SiC quasi-superlattices can be produced by this method.

By now we know almost nothing about works on production of p-3C-SiC. Probably, it is due to the fact that the basic acceptor impurity (aluminium) accumulates on the interfaces of the twins and other structural defects in the 3C film and it is electrically neutral. We managed to produce the highly doped layers p-3C based on the conducting substrates of hexagonal SiC using the method of Sublimation Epitaxy (SE). Probably, it is due to the growth high temperature used in this method. First, it results in production of the more structural-perfect epifilm and, second, in increasing the Al atomic mobility. This works purpose is further optimization of the production technology for epilayers p-3C-SiC with usage of semi-insulating substrates 6H-SiC.