The tracer self-diffusaon coefficients DT of implanted 71Ge and 31Si in both relaxed monocrystalline SiyGe1-y epilayers and specimens made from bulk SiyGe1-y have been measured as functions of temperature T (653°C ≤ T ≤ 1263°C) and composition y (0 ≤ y ≤ 1) by means of radiotracer techniques, in which serial sectioning was done by ion-beam sputtering. For all compositions, the T dependencies of DT for 71Ge and 31Si are of Arrhenius type. The y dependencies of the pre-exponential factors of the self-diffusaon coefficients and of the diffusaon enthalpies show a break at y a 0.65. This is interpreted in terms of a transition from interstitialcy-(y ≥ 0.65) to vacancy-(y ≤ 0.65) mediated self-diffusion.