We report the results of an analytical investigation on 416 silver-copper coins stemming from the Ottoman Empire (end of 16th and beginning of 17th centuries), using synchrotron micro X-ray fluorescence analysis (SRXRF). In the past, analyses had already been conducted with energy dispersive X-ray fluorescence analysis (EDXRF), scanning electron microscopy with energy dispersive X-ray spectrometry (SEM/EDX) and proton induced X-ray emission spectroscopy (PIXE). With this combination of techniques it was possible to confirm the fineness of the coinage as well as to study the provenance of the alloy used for the coins.For the interpretation of the data statistical analysis (principal component analysis-PCA) has been performed. A definite local assignment was explored and significant clustering was obtained regarding the minor and trace elements composing the coin alloys.

Traditional paper cleaning techniques are not always sufficient for cleaning artefacts. The pulsed laser cleaning can offer a valuable tool for solving problematic cases in paper conservation. Comparative studies of traditional and laser cleaning were performed on historic picture post cards. The results demonstrate the possibilities of partial laser cleaning using nanosecond laser pulses at a wavelength of 532 nm.

Simultaneous PIXE, PIGE, and RBS in air were employed to characterise the surface structure of iridescent Art Nouveau glass artefacts produced around 1900 by Tiffany, USA and Loetz, Austria. Using PIXE and PIGE, the chemical composition of the bulk glass and the overlays was determined in a non-destructive manner. Furthermore, the combination of PIXE and RBS enabled the layer structure of the analysed glasses (bulk, overlays, and iridescent layers) and the thicknesses of the thin layers in the near-surface domain to be determined. The measurement and evaluation procedure is demonstrated on blue iridescent glass fragments of Tiffany and Loetz by way of example. The initial results showing similarities but also differences in the layered glass structure of Tiffany and Loetz objects are presented.

The combination of PIXE, RBS and PIGE proves ideal for non-destructive overall analysis of reverse paintings on glass. Simultaneous PIXE–RBS studies assist to clarify the thin-layered pigment arrangements of details painted on the reverse of the glass pane. In a second measurement, the spectra of both PIGE–PIXE taken from the pure glass front side inform on the individual glass type. This complete perception of corresponding unique objects is important and valuable regarding the knowledge of special painting techniques and the necessity of preventive conservation.

Historic glass objects belong to the valuable artistic and cultural heritage that suffers a progressive deterioration due to atmospheric effects. For predicting the chemical stability of a glass object showing no visible alteration or corrosion damage, the three ion beam techniques PIGE, PIXE and RBS have been combined in simultaneous measurements at the Rossendorf external proton beam. Non-destructive determination of the glass bulk composition despite a thin corrosion layer on the glass surface facilitate the identification of glasses which are sensitive to environmental degradation, hence require specific storage conditions. The complete analytical reproduction of the chemical composition of unaffected glass using the combination of PIGE and PIXE is also discussed.

EDXRF analysis with subsequent multivariate data analysis proves useful for the determination of the authenticity of iridescent glass artifacts. Thus, clusters of the glass groups investigated were formed which can be associated with the glass manufacturers. By means of ion beam analysis with the external proton beam the producing technology of iridescent glass objects of the Art Nouveau glass manufacturer Loetz/Austria with so-called Papillon pattern was characterised in a non-destructive way. Due to the simultaneous application of PIXE and RBS the glass structure including a sequence of glass layers covered with a SnO2-layer of approximately 50 nm thickness on the surface could be described.

Glass treated on its surface with silver compounds and an aluminosilicate, such as ochre or clay, at higher temperatures (between 550 and 650 °C) accepts a wide variety of a yellow colour. It is the aim of this study to investigate the parameters of the manufacturing process affecting the final colour of silver stained glass and to correlate them with the final colour and colour intensity. Therefore, defined mixtures of ochre and a silver compound (AgCl, AgNO3, Ag2SO4, Ag3PO4, Ag2O) were prepared and applied on soda-lime glass. The firing process was modified within the range from 563 to 630 °C and glass samples were analysed after treatment with energy dispersive X-ray fluorescence analysis (EDXRF), scanning electron microscopy (SEM/EDX), transmission electron microscopy (TEM), as well as ion beam analysis (IBA) with an external beam. Within the scope of IBA simultaneous measurements using particle-induced X-ray emission (PIXE), particle-induced gamma-ray emission (PIGE), and Rutherford backscattering spectrometry (RBS) were carried out in order to obtain the thickness of the Ag-rich surface layer and the depth distribution of Ag. By means of TEM the microstructure of the silver particles was visualised. XRF results show that the lowest amount of Ag could be detected on glass samples treated with silver stain mixtures containing AgCl and Ag2O. A low kiln temperature (e.g. 563 °C) results in a higher silver concentration at the surface and lower penetration depths. Furthermore, the results obtained with SEM/EDX at cross-sections of the glass samples could be confirmed by PIXE, PIGE, RBS, and TEM.

Particle induced X-ray emission (PIXE) at the external proton beam has proved ideal to study individual techniques of creating art objects. In particular, PIXE is suitable for examining paintings because of the low level of background produced by organic components like binders and paper backings. Thus, traces of pigments as deposited from pens on cardboard can be identified by this method. The combination of PIXE with external Rutherford backscattering spectrometry (RBS) allows non-destructive characterisation of near surface and thin film arrangements of paint materials. Thicker but less complex layers of oil paintings can be identified by special procedures of depth-resolved PIXE investigation. In this case, RBS provides additional information on organic coverings like madder lake or varnishes.

The external proton beam of the Tandem accelerator of the Research Centre in Rossendorf/Germany was used to carry out non-destructive particle-induced X-ray emission (PIXE) particle-induced gamma-ray emission (PIGE) and Rutherford backscattering (RBS) measurements simultaneously on Art Nouveau artifacts produced around 1900 by Tiffany/USA and Loetz/Austria. These studies should proof the technology of producing an iridescent layer on a glass surface. By means of the yield ratio Y(Si-K)/Y(Si-γ) of both characteristic X-radiation (Si-K) and γ-radiation (Si-γ) of the element silicon it could be shown that a thin top layer is present on the glass surface due to the treatment of the heated artifacts (about 500°C) with an alcoholic solution of SnCl2 [1]. Combined evaluation of the PIXE and RBS spectra resulted in a thickness of 20–300 nm for this top layer. In addition, a transition region between the iridescent layer and the bulk glass was obtained by RUMP simulations. Approximately 80% of the total amount of the Sn were found to be present in this transition layer and only 10–20% in the outermost surface region. XPS studies showed that the outermost layer consists of SnO2. The formation of other Sn compounds in the outermost near-surface region based on Sn–Si–O during the manufacturing process can be excluded.

(ROX97 Rossendorf-Oxford, version 1997), the new paper-based secondary standard for storing, reproducing and comparing relative X-ray efficiency curves, has been distributed to different analytical laboratories for initial tests. Several standard X-ray techniques as PIXE, XRF and EDX have been involved. Quantitative inter-laboratory comparisons are presented for PIXE facilities operating in-vacuum as well as on external proton beams. In the case of XRF and EDX typical spectra taken from the standard are compared in the context of the individual experimental conditions. Regarding both the different sources of X-ray excitation and X-ray detection units the advantages and limits of ROX97 are discussed to deduce information on required upgrading improvements.

A secondary multielement standard for energy dispersive X-ray analysis has been developed. The standard consists of high purity paper doped from solution with selected compounds generating characteristic X-ray lines of similar intensities within the energy region 1.5–15 keV. This standard will provide means for a simplified calibration procedure allowing regular stability testing of efficiency curves for X-ray spectrometers. The rationale and the fabrication process of the paper-based standard are described. The elemental homogeneity and stability under ion-bombardment were tested macroscopically and microscopically. The results include numerical data, spectra, elemental distribution maps and line scans. It is concluded that under typical experimental conditions the developed standard exhibits suitable homogeneity and stability for routine X-ray analyses and that it has the potential for inter-laboratory comparisons.

Ion beam based composition analysis of silicate materials can be strongly affected by natural surface corrosion. The simultaneous application of Proton Induced X-ray Emission (PIXE) and Proton Induced Gamma-ray Emission (PIGE) proves useful to distinguish between thin or extended leached surface areas on glasses. Among others, those preliminary studies form the basis to decide on the applicability of PIXE to analyse the composition of bulk glass. The novel method of non-destructive glass surface evaluation may assist in the field of conservation and restoration of art objects made from glass.

Thin sputter deposited layers with a nominal composition of Nd2Fe14B (thickness 120 to 400 nm) on Si/SiO2 were analysed by the combined application of RBS and heavy ion ERDA, These methods, based on elastic Coulomb scattering, are advantageous for composition analysis of thin compound layers due to their known cross sections, For high accuracy it is necessary that the spectral contributions of each element can be separated from each other and from the substrate background. This is difficult for light elements with RBS. The light element concentration however can be measured by ERDA with heavy incident ions, With 200 MeV I-127 ions from the Munich MP tandem the light elements as well as the Fe recoils were detected using a gas telescope. The Fe peak was used as cross reference to the RBS measurements.With 35 MeV Cl-35 ions at the 5 MV Rossendorf tandem too little energy is transferred to the Fe recoils to be identified with the Bragg ionisation chamber (BIC) detector. Therefore a thin aluminium layer was evaporated onto the Nd2Fe14B layer. The aluminium peak is well separated both in the RBS and in the ERDA spectra and is used as cross reference here.

200 keV Fe+ ions were implanted into silicon at 350°C to investigate the phase formation of α-, β-FeSi2 and ϵ-FeSi. Doses of 1, 3, 5, and 7 × 1017 cm−2 were used to produce different silicides. Subsequent annealing of three samples (1, 3, and 7 × 1017 cm−2) at 1150°C for 30 s leads to phase transitions and changes of the silicide fractions. The sample implanted with 5 × 1017 cm−2 Fe was irradiated with 3 MeV Si at room temperature, and shows significant changes in the phase composition, too. Conversion electron Mössbauer spectroscopy, Auger electron spectroscopy sputter depth profiling, Rutherford backscattering spectroscopy and X-ray diffraction were used for sample characterization. The results of the different methods, which have different depth sensitivities are combined and compared to each other. The results are discussed with respect to the different processes which take place during implantation, annealing and post irradiation.