UNAXIS KAI PECVD reactors developed for AM LCD technology have been demonstrated to process a high potential for manufacturing of thin film silicon solar cells based on amorphous and microcrystalline silicon. The single-chamber KAI reactors could fabricate already cells and modules. First microcrystalline silicon and micromorph tandem test cells of 5.5 % respectively 9.16 % were obtained. Up-scaling to sub-modules (491.5 cm2) by laser patterning resulted in initial aperture efficiencies of 8.8 % for a-Si:H p-i-n cells. A first prototype module of 0.447 m2 active area with 7.1 % initial efficiency has been achieved for amorphous silicon. Up-scaling of LP-CVD ZnO to areas of 1.4 m2 is ongoing for the next generation of a-Si:H and µc-Si:H based solar cell modules.

Note: IMT-NE Number: 398 Reference PV-LAB-CONF-2004-009 Record created on 2009-02-10, modified on 2017-05-10