In this work the spectroscopic ellipsometry and the reflectometry/transmission measurements together with an advanced plasma monitor were used for inline measurements. All systems were installed in an inline sputtering equipment which enables a continuous deposition process—the condition for a direct feedback to the deposition parameters. The metrology tools were connected by a framework software which used an XML over TCP/IP connection. The setup allowed to control the multilayer deposition using a deposition script and to use the metrology tools for measuring the thicknesses and to correct the deposition rates.

High-reflective (HR) and even more antireflective (AR) layer systems are in use for widespread applications. Multifunctional layer systems providing high optical functionality with an easy-to-clean or a self-cleaning behaviour would be preferable for many applications to avoid soiling of the surface. In this paper, the feasibility of fabrication by highly productive pulse magnetron sputtering, in an in-line coating plant is investigated. Easy-to-clean properties are achieved by a top layer of photocatalytic and photoinduced hydrophilic TiO2.Multifunctional HR layer systems were successfully deposited on glass and polyethylene terephthalate (PET) substrates at a low deposition temperature of 150 degrees C, demonstrating the possibility of coating certain polymer materials. Double-sided multifunctional AR layer systems with a single-sided photoinduced hydrophilic TiO2 top coating have a resulting reflectivity of about 3% and transmittance of about 97% in the visible range of light. (C) 2007 Elsevier B.V. All rights reserved.

In this paper we describe a method for the synthesis of SiC-nanorods on different substrates by using chemical vapor deposition. Similar to the growth of single- and multi-walled carbon nanotubes, SiC-nanorods grow about a catalytically controlled process. Suitable catalysts are Fe, Ni, or Co. For the deposition we used a ferrocene [Fe(C5H5)(2)], a hydrocarbon (C6H6 or C6H14), and as the precursor for silicon, the liquid SiCl4. HRTEM-investigations with EEL- and EDX-spectroscopy show the well-developed SiC-nanorods. The yield of SiC is dependent on the gas phase composition, especially the concentration of ferrocene and the hydrogen excess. During on Si-substrates branched nanorods are always formed with the catalyst particle on the tip; on WC/Co hardmetals an interaction can be observed between the catalyst Co and the SiCl4 (Co-silicides).

Hard composite layers consisting of TiC and amorphous carbon have been prepared by plasma-assisted chemical vapour deposition. It could be shown by high-resolution transmission electron microscopy (TEM) that nanocrystalline TiC particles are embedded in a matrix of amorphous carbon. Further TEM investigations revealed the occurrence of cracks in regular distances of approximately 400 nm. The stress state of TiC, amorphous carbon (a-C) and TiC/a-C layers was determined by the measurement of the substrate curvature in dependence on the layer thickness. High compressive stress was found for the TiC layers independent of the layer thickness, whereas a-C layers yielded only a low compressive stress. The stress difference of the two components is the reason for crack formation in the composite layers leading to a stress relaxation increasing with the layer thickness. Sliding tests with layers of compositions corresponding to the maximum hardness demonstrated a sliding and abrasive wear behavior comparable to that of PVD metal containing diamond-like carbon.

Composite layers, which consist of TiC and hard amorphous carbon (a-C), have been prepared by plasma-enhanced chemical vapour deposition (PACVD). It is shown using high-resolution transmission electron microscopy (HRTEM) that the carbon phase forms a matrix, in which nano-crystalline TiC particles are embedded. The layers were characterized by X-ray photoelectron spectroscopy (XPS) and electron energy-loss spectroscopy (EELS) with respect to the binding state of the carbon. According to the XPS and EELS measurements, the carbon was found to be largely sp3 hybridized (>70%). The hydrogen content of the carbon phase amounted to 8–10 at.%. As-prepared pure carbon layers are nearly stress relaxed, as it is demonstrated by use of the substrate curvature method.

Hard layers consisting of TiCx, and amorphous carbon have been co-deposited from CH4–TiCl4–H2–Ar gas mixtures, by plasma CVD varying the carbon-concentration in a wide range. The layers were characterized with respect to their composition, structure and some properties. The influence of the CH4/TiCl4 ratio and the addition of hydrogen on the layer constitution and behavior were especially investigated. The TEM investigations demonstrated a homogeneous distribution of the TiCx crystallites and a grain size of approximately 4–7 nm. The layers are textureless and with an increasing amorphous carbon content as the surface roughness decreases. The microhardness depends on the excess amount of carbon and the content of dissolved hydrogen. If the deposition process is realized without any additional H2 in the gas phase, the microhardness increases strongly (>4000 HV [0.02]) and a maximum microhardness was observed at 60 at.% carbon in the coating. Stress measurements carried out by XRD and the beam bending method revealed generally that the high compressive stress occuring in stoichiometric TiC layers, significantly decreases in TiCx/a-C layers. Nevertheless, all the composite layers showed a low adhesion on different substrates. An improvement could be achieved by the pre-deposition of suitable interlayers. The low friction coefficient and the favorable surface roughness make PACVD–TiCx/a-C-layers a good candidate for sliding wear applications.