This paper deals with experimental and computer studies of sputtering : nd scattering of ions with energies of several keV from Cu and InSb single crystals. A substantial importance of the ejected particle channelling for the formation of some peaks in the patterns of spatial distribution of scattered ions and sputtered atoms has been shown.

The spatial distribution of reflected particles was experimentally studied in the case of oblique incidence of 4.5 keV Ar ions on a (001) Cu face along the (110) and (100) planes. The distribution in ejection angles of the reflected particles was found to have several peaks and minima. To explain the results of these reflection experiments a computer study was performed. The shape of the calculated spatial distribution curves appears to be very sensitive to variations of the constants in the interaction potentials. Some features of the spatial distribution of the reflected ions have been shown to be connected to the motion of ions in surface semichannels. The spatial distribution of the neutral component of scattered and sputtered particles was also studied in the experiments. A predominant yield of the sputtered particles was observed not only in the low-index but also in high-index directions.

The report presents some results of experiments and a computer study of the spatial distribution of ions reflected from a single crystal.