Nanowire-based field-effect transistors (FETs) have demonstrated considerable promise for a new generation of chemical and biological sensors. Indium arsenide (InAs), by virtue of its high electron mobility and intrinsic surface accumulation layer of electrons, holds properties beneficial for creating high performance sensors that can be used in applications such as point-of-care testing for patients diagnosed with chronic diseases. Here, we propose devices based on a parallel configuration of InAs nanowires and investigate sensor responses from measurements of conductance over time and FET characteristics. The devices were tested in controlled concentrations of vapour containing acetic acid, 2-butanone and methanol. After adsorption of analyte molecules, trends in the transient current and transfer curves are correlated with the nature of the surface interaction. Specifically, we observed proportionality between acetic acid concentration and relative conductance change, off current and surface charge density extracted from subthreshold behaviour. We suggest the origin of the sensing response to acetic acid as a two-part, reversible acid-base and redox reaction between acetic acid, InAs and its native oxide that forms slow, donor-like states at the nanowire surface. We further describe a simple model that is able to distinguish the occurrence of physical versus chemical adsorption by comparing the values of the extracted surface charge density. These studies demonstrate that InAs nanowires can produce a multitude of sensor responses for the purpose of developing next generation, multi-dimensional sensor applications.
The conductance due to scattering by a single repulsive Coulomb impurity is measured as a function of gate voltage in backgated InAs nanowires by analysis of random telegraph noise. Comparison with a quantum mechanical theory for carrier response and scattering reveals that the large dielectric mismatch between the nanowire and its surroundings enhances the Coulomb interaction, produces a nonlinear screening process that weakens dielectric response, and enhances the self-consistent Coulomb-impurity barrier of a single repulsive impurity, as nanowire diameter is reduced. Consequently, the scattering rate by such an impurity is enhanced by nearly two orders magnitude for 30 nm diameter InAs nanowires. A dramatic asymmetry of scattering by repulsive and attractive impurities, where the latter produce majority carriers, explain how a single repulsive impurity can control the conductance of a 1 mu m long InAs nanowire. Relevance to proposed nanoelectronic and sensing devices is discussed.
Indium-arsenide–gallium-arsenide (InAs–GaAs) core-shell, wurtzite nanowires have been grown on GaAs (001) substrates. The core-shell geometries (core radii 11 to 26 nm, shell thickness >2.5 nm) exceeded equilibrium critical values for strain relaxation via dislocations, apparent from transmission electron microscopy. Partial axial relaxation is detected in all nanowires increasing exponentially with size, while radial strain relaxation is >90%, but undetected in nanowires with both smaller core radii <16 nm and shell thicknesses <5 nm. Electrical measurements on individual core-shell nanowires show that the resulting dislocations are correlated with reduced electron field-effect mobility compared to bare InAs nanowires.
Nature Nanotechnology 5, 737–741 (2010); published online: 19 September 2010; corrected after print: 6 December 2010. In the version of this Letter originally published, a label in Figure 1a was incorrect. There were also two minor text errors. These errors have now been corrected in the HTML and PDF versions of the text.
We studied the conditions for the Stranski-Krastanov mode of molecular beam epitaxial growth of InAs on a cleaved GaAs(110) surface. Temperature distributions on a subholder with cleaved facets were revealed using thermophotography. Combining these data with a theoretical model enabled a determination of the real temperature on the cleaved-edge surfaces (110), which differed markedly from the temperature on a planar wafer (100). Based on these results, we proposed an approach that combines different growth conditions in one technological process. As a result, appropriate growth conditions were established for InAs quantum dots grown on the cleaved GaAs(110) surface. Control over the dot nucleation process was shown to permit growth of both linear arrays of quantum dots and planar quantum wires on these (110) surfaces.