A concept of patternable top-coats dedicated to directed self-assembly of high- χ block copolymers is detailed, where the design enables a crosslinking reaction triggered by thermal or photo-activation. Nanostructured BCP areas with controlled domains orientation are selected through a straightforward top-coat lithography step with unique integration pathways. Additionally, the crosslinked nature of the material enables the suppression of the BCP dewetting, while exhibiting exceptional capabilities for the construction of 3D stacks.