A highly photosensitive negative type photoresist has been developed for patterned spacers of thin-film-transistor liquid crystal display. In order to enhance its photo-polymerization efficiency, a novel reactive binder was used as well as a highly reactive UV-curing agent that also promotes dissolution. In addition, it was found to be a reliable material for fabrication of spacer patterns with good mechanical strength and chemical resistance. Correlations between individual components and the characteristics of the photoresist and the resultant column spacer patterns were also investigated.

Luminescence properties of YBO3-GdBO3 solid solutions doped with Tb3+ have been investigated in order to understand the energy transfer processes between Gd3+ and Tb3+ in these phosphors. The critical atomic fraction (X-c) and the critical distance (R-c) for efficient energy migration among Gd3+ ions were derived. In YBO3-GdBO3 : Tb solid solutions, (Gd3+-BO33-) absorbs excitation energy more efficiently than (Y3+-BO33-) in the VUV region. (C) 2000 Elsevier Science B.V. All rights reserved.

Excitation and emission characteristics were reviewed for phosphors which were reported, applied, or suggested for the plasma display panel (PDP). Correlation of luminescence characteristics to the host crystal structure and the activator of the phosphor was explained. Improvements of the PDP phosphor for practicality were considered.

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