The ability to fabricate micro/nanostructures by non-conventional method is essential in the future development of functional devices.In this respect, polymers are potentially ideal micro/nanoscale building blocks because of their natural length scale, well-defined architecture, controlled synthesis, ease of processing and wide range of chemical functionality.In this paper, we have presented several patterning methods in the use of homopolymers, block copolymers and their blends to pattern polymer surfaces at different length scales.All these methods use templates or external field as the patterning-driven-force and achieve the purpose well.

Our previous investigation showed that the ordered hexagonal island pattern in the phase-separating polymeric blend films of polystyrene and poly(2-vinylpyridine) (PS/P2VP) formed due to the convection effect by proper control of PS molecular weight, solvent evaporation rate, and the weight ratio of PS to P2VP. In this paper, we further illustrate that, by adding a proper amount of the surfactant Triton X-100 to the PS/P2VP toluene solution, the ordered hexagonal island pattern can be transformed to the ordered honeycomb pattern. The effects of the amount of Triton X-100 on the surface morphology evolution and the pattern transformation are discussed in terms of the collapse of Triton X-100, phase separation between Triton X-100/P2VP and PS, the interfacial interaction between Triton X-100/P2VP and the mica substrate, and the Bénard-Marangoni convection.

The effects of solvent nature on the surface topographies of polystyrene (PS)/poly(methyl methacrylate) (PMMA) blend films spin-coated onto the silicon wafer were investigated. Four different solvents, such as ethylbenzene, toluene, tetrahydrofuran and dichloromethane, were chosen. They are better solvents for PS than that for PMMA. When dichloromethane, tetrahydrofuran and toluene were used, PMMA-rich phase domains protruded from the background of PS. When ethylbenzene was used, PS-rich phase domains elevated on the average height of PMMA-rich phase domains. In addition, continuous pits, networks and isolated droplets consisted of PS formed on the blend film surfaces with the decrease of polymer concentrations. The mechanism of the surface morphology evolution was discussed in detail.

Polymer concentration and shear and stretch field effects on the surface morphology evolution of three different kinds of polymers (polystyrene (PS), polybutadiene (PB) and polystyrene-b-polybutadiene-b-polystyrene (SBS)) during the spin-coating were investigated by means of atomic force microscopy (AFM). For PS and SBS, continuous film, net-like structure and particle structure were observed at different concentrations. For PB, net-like structures were not observed and continuous films and radial array of droplets emerged. Moreover, we compared surface morphology transitions on different substrate locations from the center to the edge. For PS, net-like structure, broken net-like structure and irregular array of particles were observed. For SBS, net-like structure, periodically orientated string-like structure and broken-line structure appeared. But for PB, flower-like holes in the continuous film, distorted stream-like structure and irregular distributions of droplets emerged. These different transitions of surface morphologies were discussed in terms of individual material property.

Evaporation of a droplet of silica microsphere suspension on a polystyrene and poly(methyl methacrylate) blend film with isolated holes in its surface has been exploited as a means of particles self-assembly. During the retraction of the contact line of the droplet, spontaneous dewetting combined with the strong capillary force pack the silica microspheres into the holes in the polymer surface. Complex aggregates of colloids are formed after being exposed to acetone vapor. The morphology evolution of the underlying polymer film by exposure to acetone solvent vapor is responsible for the complex aggregates of colloids formation.

The patterned substrate with alternating SiO2 and octadecyltrichlorosilane (OTS) self-assembled monolayers (SAM) was used to induce phase separation of PS (polystyrene) and PVP (poly2-vinylpyridine) binary polymer blend films. The PS- and PVP- phase were situated on the OTS and SiO2 domains, respectively. It revealed that even though the characteristic length scales (D) of phase separation were different from the periods of prepatterned substrates (λ), if the surface interaction between each component and substrate is strong enough, the lateral growth of phase separation domains is significantly constrained and the domains replicate the surface patterns.

The surface morphologies and properties of polystyrene (PS)/poly(2-vinylpyridine) (PVP) blend films cast on the mica substrate from ethylbenzene solution were investigated upon controlling different weight ratios and solvent evaporation rates. A near-honeycomblike surface morphology of the PS/PVP blend film formed under controlling the solvent evaporation rate due to the effect of Marangoni-Benard convection. The results of static water contact angles, X-ray photoelectron spectroscopy, solvent selective etching, and treatment by water illustrated that the near-honeycomblike structures on the surface of PS/PVP blend films were different for different weight ratios of PS and PVP. After treatment with water for several minutes, PVP islands-like structure emerged in the holes of the film for a PS/PVP weight ratio of 4/1, and a quasihexagonal arrangement of alternate big and small PVP droplets emerged on the top layer of the film for a PS/PVP weight ratio of 7/1. The formation mechanisms of different surface structures and their response behaviors to water were discussed.

Honeycomb macroporous films fabricated by the "breath figures" method were composed of poly2-vinylpyridine (P2VP) distributed in the holes of polystyrene (PS). The porous films exhibited reversible behavior responding to water and different solvent vapors. When the porous film was treated with water, the honeycomb pattern would change to the hexagonal islandlike pattern. Once heated to remove the water, the honeycomb pattern emerged again. When the porous film was exposed to different solvent vapors, the same reversible process appeared. Carbon disulfide (CS(2)), toluene (TOL), and tetrahydrofuran (THF) solvent vapors induced the honeycomb pattern into the ordered islandlike pattern, and ethanol, chloroform, methyl ethyl ketone (MEK), and dimethylformamide (DMF) solvent vapors made the islandlike pattern come back to the honeycomb pattern. The hygroscopic property of P2VP and the polymer-solvent interaction are the driving force for the reversibly switchable morphology. The appropriate control of the hole depth is very crucial in determining the reversible changes.

A transition of morphology from island-like structure to disordered and ordered holes on the surface of polystyrene (PS) and poly(2-vinylpyridine) (PVP) blend films were observed with the increase of humidity. At appropriate weight ratio of PS/PVP and PS molecular weight, when humidity reached to a critical value, the hexagonal arrays of holes formed for PS/PVP blend films due to ‘breath figures’ stabilized by PVP with its strong hygroscopic characteristics during phase separation.

The phase behavior of a miscible PS/PVME (80/20, w/w) blend film in a confined geometry has been investigated at the annealing temperature much lower than the low critical solution temperature (LCST) of the blend. When the annealing temperature (52°C) is near the glass transition temperature of the blend (51.2°C), PVME-rich phase at the air–film surface under a microchannel forms smaller protrusion. When the annealing temperature is increased to 70°C, the protruding stripes, which are almost developed, are mainly composed of the mobile PVME-rich phase. These results reveal that the capillary force lead to the enrichment of PVME-rich phase at the air–polymer interface of a PDMS microchannel, that is, the capillary force lithography (CFL) can induce the phase separation of PS/PVME blend films.

Ordered hexagonal droplets patterns in phase-separating polymeric blend films of polystyrene and poly(2-vinylpyridine) (PS/PVP) formed due to the convection effect by solvent evaporation. The influences of PS molecular weight, solvent evaporation rate, and the weight ratio of PS to PVP on the PVP-rich domains pattern formation and distributions were investigated by atomic force microscope (AFM). Only in an appropriate range of molecular weight of PS, can the ordered pattern form. Too low or too high molecular weight of PS led no ordered pattern due to the viscosity effects. The increase of solvent evaporation rate decreased the mean radius of the PVP-rich domains and the intervals between the centers of the domains due to the enhancement of the viscosity on the top layer of the fluid film. The increase of the weight ratio of PS to PVP decreased mean radius of the PVP-rich domains whereas the intervals between the centers of droplets remained constant. Therefore, the size and the distributions of ordered patterns can be tuned by the polymer molecular weight, the weight ratio of the two components and the solvent evaporation rate. It revealed that the hydrodynamic effects played a significant role on the pattern formation and distributions.

We have followed the time development of the microdomain structure in symmetric diblock copolymer poly(styrene-b-methyl methacrylate), P(S-b-MMA), ultrathin films via PMMA-selective solvent vapor treatment by atomic force microscopy (AFM). After preparation on a substrate preferentially attracting the PMMA block, PS forms a continuous layer at a film's free surface. With subsequent solvent vapor treatment, the film gradually shows a well-ordered hexagonally packed nanocylinders structure. It is shown that only when the film thickness is less than the 1/2L(0) (lamellar repeat spacing), and exposed to PMMA block selective solvent for an appropriate time, can the well-ordered hexagonally packed nanocylinders form. On an extended solvent vapor treatment, a mixed morphology containing nanocylinders and stripes appears, followed by the striped morphologies. When the annealing time is long enough, the film comes back to the flat surface again, however, with PMMA instead of PS dominating the free surface. Thickness confinement and solvent induced reconstruction of the film are shown to be responsible for the P(S-b-MMA) morphology and surface chemistry development.