The effect of the lateral inhomogeneity resulting from the diffusive instability development during epitaxial growth on the kinetics of low-temperature photoluminescence of the Si0.9Ge0.1–Si heterostructures is shown.

The properties of metastable Si 1 − x Ge x /Si (10% < x < 16%) layers grown by molecular beam epitaxy on Si(100) substrates have been investigated using atomic force microscopy, X-ray diffraction, and low-temperature luminescence spectroscopy. It has been shown that ring-like aggregates are formed on the surface of layers grown at temperatures of 500–700°C. The size and shape of these aggregates suggest that their formation is associated with the diffusion instability arising due to the existence of a relationship between the surface diffusion, stresses, and the wetting potential during the growth of the epitaxial film. The existence of deviations from the homogeneous germanium distribution in the layer plane has been confirmed by a detailed analysis of the X-ray rocking curves and two-dimensional diffraction patterns. The structures with severe surface disturbances are characterized by an abnormal change in the decay times of the emission lines of bulk silicon, which indicate the presence of local electric and/or strain fields in subsurface regions. The perturbations of the flat crystallization front are suppressed as the growth temperature of layers decreases to 350°C. Despite the absence of a coating layer of silicon, the photoluminescence spectra of the layers themselves depend weakly on their thickness and growth temperature and remain sensitive only to the technological concentration of germanium. A slowly decaying luminescence associated presumably with the localization of excitons near the SiGe-Si interface has been observed in one of the samples grown at a temperature of 700°C and containing a dense array of ring-like aggregates.

The photoinduced charge redistribution in Zn(Cd)Se/ZnMgSSe/GaAs quantum-well heterostructures under different conditions of optical excitation has been investigated using scanning probe microscopy and optical spectroscopy in the temperature range from 5 to 300 K. Excitation of the samples by radiation with a photon energy greater than the band gap of Zn(Cd)Se leads to the accumulation of electrons in quantum wells, which is detected using scanning spreading resistance microscopy. For moderate excitation densities (up to 25 W/cm2) and at temperatures ranging from 80 to 100 K, the density of a quasi-two-dimensional electron gas formed in quantum wells is several orders of magnitude higher than the density of electron-hole pairs generated by the excitation radiation. The excess electron concentration in the quantum well leads to a broadening of the exciton resonances and to an increase in the relative intensity of the donor-bound exciton emission line and also determines the increase in the luminescence quantum yield with increasing excitation intensity. An additional illumination with a photon energy less than the band gap of Zn(Cd)Se decreases the concentration of excess electrons in quantum wells. The influence of the additional illumination is observed at a temperature of approximately 100 K and almost completely suppressed at 5 K. The obtained results are explained in terms of the formation of a potential barrier for electrons at the ZnMgSSe/GaAs interface and by the specific features of recombination processes in the electron-hole system containing impurity centers with different charge states.

The exciton states in Zn(Cd)Se/ZnMgSSe quantum wells with various degrees of diffusive spreading of interfaces are studied by optical spectroscopy methods. Luminescence lines of free excitons are identified. It is shown that, in addition to exciton level shift, heterointerface spreading enhances exciton-phonon coupling and increases the energy shift between maxima of emission lines of free and bound excitons. The major causes of the observed phenomena are discussed.