Annealing is a major step in the fabrication of magnetic tunnel junctions (MTJs). It sets the exchange bias between the pinned and antiferromagnetic layers, and helps to increase the tunnel magnetoresistance (TMR) in both amorphous and crystalline junctions. Recent research on MTJs has focused on MgO-based structures due to their high TMR. However, the strict process control and mandatory annealing step can limit the scope of the application of these structures as sensors. In this paper, we present AlOx-based MTJs that are produced by ion beam sputtering and remote plasma oxidation and show optimum transport properties with no annealing. The microfabricated devices show TMR values of up to 35% and using NiFe/CoFeB free layers provides tunable linear ranges, leading to coercivity-free linear responses with sensitivities of up to 5.5%/mT. The top-pinned synthetic antiferromagnetic reference shows a stability of about 30 mT in the microfabricated devices. Sensors with linear ranges of up to 60 mT are demonstrated. This paves the way for the integration of MTJ sensors in heat-sensitive applications such as flexible substrates, or for the design of low-footprint on-chip multiaxial sensing devices.

Obtaining high efficiency spin filtering at room temperature using spinel ferromagnetic tunnel barriers has been hampered by the formation of antiphase boundaries due to their difference in lattice parameters between barrier and electrodes. In this work we demonstrate the use of LiTi2O4 thin films as electrodes in an all-spinel oxide CoFe2O4-based spin filter devices. These structures show nearly perfect epitaxy maintained throughout the structure and so minimise the potential for APBs formation. The LiTi2O4 in these devices is superconducting and so measurements at low temperature have been used to explore details of the tunnelling and Josephson junction behaviour.

Magnetic tunnel junction (MTJ) research has been focused on MgO-based crystalline structures due to high tunnel magnetoresistance (TMR), despite requiring a more severe process control than previous generations of MTJ stacks based on amorphous barriers (e.g. AlOx). In this work, we study the electrical transport properties in AlOx barriers in MTJ sensors fabricated using Ion beam sputtering and remote plasma oxidation. Amorphous barriers were prepared from oxidation of thin Al films, deposited in single step barrier (SSB-Al 1 nm/oxidation) or double step barrier (DSB-Al 0.5 nm/oxidation/Al 0.5 nm/oxidation) structures. We show tunable resistance-area products (RxA) ranging from ≈10Ωμm2 (suited for nano devices) up to ≈100kΩμm2 (suited for large area sensors) with TMR above 30%. For all geometries studied, the structures have a coercivity free linear response and require none or one annealing step. This makes them very competitive for all industrial applications where the TMR level is not the dominant specification to meet.

Magnetic field mapping with micrometric spatial resolution and high sensitivity is a challenging application, and the technological solutions are usually based on large area devices integrating discrete magnetic flux guide elements. In this work we demonstrate a high performance hybrid device with improved field sensitivity levels and small footprint, consisting of a ultra-compact 2D design where nanometric spin valve sensors are inserted within the gap of thin-film magnetic flux concentrators. Pole-sensor distances down to 400 nm are demonstrated using nanofabrication techniques combined with an optimized liftoff process. These 100 × 100 μm2 pixel sensors can be integrated in modular devices for surface mapping without moving parts.

Highly sensitive nanosensors with high spatial resolution provide the necessary features for high-accuracy imaging of isolated magnetic nanoparticles or mapping of magnetic fields. Here, we fabricated nanosensor devices based on MgO-magnetic tunnel junctions with soft pinned sensing layer. The exchange interaction at the free-layer is tuned to yield distinct linear operation ranges for the nanosensors. Circular (diameter D = 120-500 nm) and elliptical pillars with low aspect ratio (120 nm × 130 nm- 120 nm × 200 nm) displaying a linear non-hysteretic transfer curves with tunnel magnetoresistance values up to 143% were obtained. A noticeable improvement in the sensitivity for circular structures from an average value of ~1%/mT up to ~2%/mT is observed with the use of a CoFe/CoFeB/Ta/NiFe/MnIr free-layer. The sensitivity values are almost independent on the size for circular devices, consistent with a linear operation range dominated by the exchange field strength. For elliptical devices, a high sensitivity is also observed, although displaying a dependence on the size, due to a competition with the demagnetizing field. The low-frequency noise features were also addressed revealing a detectivity in the tens of μT/√Hz with Hooge parameters within 1-3 × 10 -9 μm 2 in the linear range. Nevertheless, such high sensitivity values are a major improvement in comparison with those reported previously for nanometric sensors, and extremely competitive with values reported for micrometric spin-valve sensors, with the advantage of providing a reduced device footprint suitable for highly resolved measurements.