In this work we show an experimental study of plasmas generated by a pulsed discharge in order to produce hard coatings of TiN. Optical spectroscopy techniques were used to study the emission characteristics of the plasma. A methodology as been applied that relates the intensity of different emission lines, to calculate the excitation temperature. In both cases one o most obtain integral over each line profile. The Stark broadening was measured by determining the FWMH of the line profile and subtracting the instrumental broadening, the line shapes obtained show a mostly Lorentzian profile and thus, Doppler broadening may be neglected.

Carbon‐based coatings were produced by arc plasma for physical vapor deposition starting from HOPG (High Oriented Pyrolitic Graphite) target. The coatings were deposited on substrates of silicon (100) and (110) a temperature of 46°C. XRD spectra and AFM images were taken on samples, further the plasma was characterized by OES. The low temperature of deposition process allows its employ in a wide range of applications.

A database was designed starting from the Kurucz cd-rom NO 23 of the Smithsonian Astrophysical Observatory. In this database the different atomic elements are ordered by wavelength with their ionization levels. Also, there are other data like statistic weight, Einstein's coefficient, information about energy levels, constant of damping, among others. The spectra of the discharge are processed using a digital filtrate technique, with the purpose of reducing the noise present in the data to the and to locate the points where the maximum amplitudes are presented. Starting from these results, consultations dynamic SQL are make, these obtain the elements present in this regions from the database. Finally, by means of the use of statistical methods it is determined which are the elements that have the highest probability of conform the plasma.