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职业迁徙
个人简介
• Primarily engaged in R&D activities in optimization of deposition process of extreme ultraviolet lithography (EUVL) mask blanks to improve on mask blank performance, particularly on ultra-low defect deposition process and optimization of multilayer film properties
• Actively took part in process development of next generation absorber materials, as well as next generation multilayer structure
• Performed a series of design of experiments (DoE) for problem solving and process optimization
• Involved in system hardware design and process optimization for mask blank defect reduction, with close collaboration with hardware team to ensure high system uptime
• Primary process owner for various metrology tools to characterize mask blank performance, including mask blank and wafer defect inspection tools, reflectometry measurements for reflectance/optical properties characterization and interferometry measurements for mask blank flatness characterization etc
• Key contact person with various external metrology vendors to maintain high system uptime of their tools, as well as with internal IT team for setup of business-related applications and automation software to help in daily repeating job tasks
• Actively took part in process development of next generation absorber materials, as well as next generation multilayer structure
• Performed a series of design of experiments (DoE) for problem solving and process optimization
• Involved in system hardware design and process optimization for mask blank defect reduction, with close collaboration with hardware team to ensure high system uptime
• Primary process owner for various metrology tools to characterize mask blank performance, including mask blank and wafer defect inspection tools, reflectometry measurements for reflectance/optical properties characterization and interferometry measurements for mask blank flatness characterization etc
• Key contact person with various external metrology vendors to maintain high system uptime of their tools, as well as with internal IT team for setup of business-related applications and automation software to help in daily repeating job tasks
研究兴趣
论文共 15 篇作者统计合作学者相似作者
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Journal of Physics D: Applied Physicsno. 43 (2019)
Journal of Physics Dno. 43 (2019)
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